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公开(公告)号:US20220306891A1
公开(公告)日:2022-09-29
申请号:US17615799
申请日:2020-06-03
Applicant: RHODIA OPERATIONS
Inventor: Oleksandra ZAVGORODNYA , Denis BENDEJACQ , Laura GAGE
IPC: C09D133/10 , C09D171/12
Abstract: The present disclosure relates to a method for reducing or preventing colloids adhesion and/or fouling on a substrate in need thereof by forming a coating having a first layer that includes a polyphenol compound, and a second layer that includes a hydrophilic polymer having repeating units derived from one or more zwitterionic monomers, typically one or more betaine monomers, on the substrate. The present disclosure also relates to the coating made thereby and an article having the said coating.
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公开(公告)号:US20210251225A1
公开(公告)日:2021-08-19
申请号:US17173234
申请日:2021-02-11
Applicant: RHODIA OPERATIONS
Inventor: Amit SEHGAL , Laura GAGE , Kamel RAMDANI
IPC: A01N33/12 , A01N37/36 , A01N37/02 , A01N25/30 , A01N25/10 , C11D3/48 , C11D1/94 , C11D3/30 , C11D11/00
Abstract: The present disclosure provides a method for killing pathogens on a surface, the method comprising applying a composition to the surface, the composition comprising: at least one quaternary ammonium compound; a polymer comprising one or more types of monomer units selected from cationic monomer units, anionic monomer units, amphoteric monomer units, non-ionic monomer units, and combinations thereof, wherein at least one cationic monomer unit, amphoteric monomer unit or at least one anionic monomer unit is present when the polymer comprises one or more non-ionic monomer units; a surfactant selected from cationic surfactants, amphoteric surfactants, non-ionic surfactants, and combinations thereof; and, optionally, an organic acid, wherein the pH of the composition is less than 5; and the composition achieves at least 0.5 log reduction in the amount of live pathogens on the surface, wherein the pathogens are selected from bacterial spores, fungal spores, non-enveloped viruses and combinations thereof within about 60 minutes, under conditions of standard temperature and pressure.
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公开(公告)号:US20210230329A1
公开(公告)日:2021-07-29
申请号:US15733961
申请日:2019-06-04
Applicant: RHODIA OPERATIONS
Inventor: Gilda LIZARRAGA , Jaime HUTCHISON , Laura GAGE , Marie-Pierre LABEAU , Guillaume GODY , Sophie DEROO , Philippe MARCHAL , Hamza CHOUIRFA
IPC: C08F220/38 , C09D133/14 , C09D5/16
Abstract: The present disclosure relates to the use of a composition for reducing or preventing colloids adhesion and/or fouling on a substrate, the composition comprising a copolymer having repeating units derived from one or more zwitterionic monomers and repeating units derived from one or more phosphorous acid monomers.
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