公开(公告)号：US20240058845A1

公开(公告)日：2024-02-22

申请号：US18231720

申请日：2023-08-08

Applicant: SEMES CO., LTD.

Inventor： Dong Hee SON ,  Seong Soo LEE ,  Jeong Bin LEE ,  Sun Mi KIM

IPC: B08B3/02 ,  B08B13/00 ,  B08B3/08

CPC classification number: B08B3/02 ,  B08B13/00 ,  B08B3/08 ,  H01L21/67023

Abstract: A fluid supply device and a wafer cleaning apparatus using the same are proposed. The fluid supply device is improved to minimize occurrence of particles generated in an operational process in order to reduce contamination of a wafer. The fluid supply device includes a supply tube connected to a supply tank storing a liquid chemical and a supply valve, a drain tube connected to the supply tube by a branch tube and a drain valve, a fluid tank, a provision tube connected to the supply tube via the branch tube to provide the liquid chemical into the fluid tank, a supply valve, a tank drain tube connected to the fluid tank to drain a liquid chemical in the fluid tank, and a tank drain valve, and a controller configured to control opening and closing of each of the valves and supply of the liquid chemical supplying through the supply tube.