公开(公告)号：US20250087512A1

公开(公告)日：2025-03-13

申请号：US18739844

申请日：2024-06-11

Applicant: SEMES CO., LTD.

Inventor： Kwang Pyo LEE

IPC: H01L21/673 ,  B65G47/90

Abstract: The container of the present invention accommodates a ring carrier for supporting a ring provided in a substrate processing apparatus and comprises a housing, in which an accommodation space is formed, a slot provided in the housing and having an insertion groove formed therein, and a block located in the insertion groove, wherein the block protrudes from the slot and extends to the ring carrier and has a support surface for supporting a lower circumference of the ring carrier, and a first inclined surface sloping upward from the support surface in a normal direction of the ring carrier and having a radius larger than an arc of the ring carrier, wherein a boundary line between the support surface and the first inclined surface has a radius at least the same as the arc of the ring carrier.

公开(公告)号：US20250029851A1

公开(公告)日：2025-01-23

申请号：US18607481

申请日：2024-03-17

Applicant: SEMES CO., LTD.

Inventor： Tae Sung KIM ,  Duk Hyun SON ,  Kwang Pyo LEE

IPC: H01L21/67 ,  B08B9/032

Abstract: Proposed are a substrate processing system and a process gas supply control verification method and, more particularly, to a technology to verify the operation of a mass flow controller (MFC) that supplies a process gas for semiconductor processing at an appropriate flow rate according to a recipe.