公开(公告)号：US10755899B2

公开(公告)日：2020-08-25

申请号：US14744427

申请日：2015-06-19

Applicant: SEMES CO., LTD.

Inventor： Yong Su Jang ,  Sun Rae Kim ,  Sung Hwan Hong

IPC: H01J37/32

Abstract: The inventive concepts provide a substrate treating apparatus. The apparatus includes a process chamber, a substrate support unit, a gas supply unit, a microwave applying unit, an antenna plate, a slow-wave plate, a dielectric plate, and an exhaust baffle, and a liner. The liner includes a body having a ring shape facing an inner sidewall of the process chamber, and a flange extending from the body into a wall portion of the process chamber. The flange prevents an electric field of a microwave and a process gas from being provided into a gap between the process chamber and the body. Thus, it is possible to inhibit particles from being generated by damage of the inner sidewall of the process chamber by plasma, and drift distances of the particles can be reduced to inhibit the particles from reaching a substrate.

公开(公告)号：US20150380216A1

公开(公告)日：2015-12-31

申请号：US14744427

申请日：2015-06-19

Applicant: SEMES CO., LTD.

Inventor： Yong Su Jang ,  Sun Rae Kim ,  Sung Hwan Hong

IPC: H01J37/32 ,  H01L21/67

CPC classification number: H01J37/32192 ,  H01J37/32477

Abstract: The inventive concepts provide a substrate treating apparatus. The apparatus includes a process chamber, a substrate support unit, a gas supply unit, a microwave applying unit, an antenna plate, a slow-wave plate, a dielectric plate, and an exhaust baffle, and a liner. The liner includes a body having a ring shape facing an inner sidewall of the process chamber, and a flange extending from the body into a wall portion of the process chamber. The flange prevents an electric field of a microwave and a process gas from being provided into a gap between the process chamber and the body. Thus, it is possible to inhibit particles from being generated by damage of the inner sidewall of the process chamber by plasma, and drift distances of the particles can be reduced to inhibit the particles from reaching a substrate.

Abstract translation: 本发明的概念提供了一种基板处理装置。 该装置包括处理室，基板支撑单元，气体供应单元，微波施加单元，天线板，慢波板，电介质板和排气挡板以及衬垫。 衬套包括具有面向处理室的内侧壁的环形形状的主体和从主体延伸到处理室的壁部分的凸缘。 凸缘防止微波和工艺气体的电场被提供到处理室和主体之间的间隙中。 因此，可以通过等离子体损坏处理室的内侧壁来抑制颗粒的产生，并且可以减少颗粒的漂移距离以抑制颗粒到达基板。