公开(公告)号：US20150016236A1

公开(公告)日：2015-01-15

申请号：US14322284

申请日：2014-07-02

Applicant: SHOWA DENKO K.K.

Inventor： Akira SAKAWAKI ,  Akira YAMANE

IPC: G11B5/74 ,  G11B5/667 ,  G11B5/48

CPC classification number: G11B5/746 ,  G11B5/66 ,  G11B5/855 ,  G11B2005/0021 ,  G11B2005/0024

Abstract: Provided is a magnetic recording medium including a structure in which at least a soft magnetic underlayer, a non-magnetic intermediate layer, and a magnetic recording layer are sequentially laminated on a non-magnetic substrate, wherein the magnetic recording layer includes a first magnetic layer, a non-magnetic layer, and a second magnetic layer in order from the non-magnetic substrate side, has a structure in which the first magnetic layer and the second magnetic layer are magnetically separated from each other with the non-magnetic layer interposed therebetween, and consists of a plurality of patterns which are magnetically separated from each other, and the coercive force Hc of the second magnetic layer is larger than that of the first magnetic layer, and the coercive force Hc of the second magnetic layer is smaller than that of the first magnetic layer temporarily when the second magnetic layer is heated.

Abstract translation: 提供了一种磁记录介质，其包括其中至少软磁性底层，非磁性中间层和磁记录层依次层叠在非磁性基板上的结构，其中磁记录层包括第一磁性层 ，非磁性层和第二磁性层的顺序具有这样的结构，其中第一磁性层和第二磁性层之间以非磁性层彼此磁分离 并且由彼此磁性分离的多个图案组成，并且第二磁性层的矫顽力Hc大于第一磁性层的矫顽力Hc，并且第二磁性层的矫顽力Hc小于第二磁性层的矫顽力Hc小于 当第二磁性层被加热时临时地存在第一磁性层。

公开(公告)号：US20130188278A1

公开(公告)日：2013-07-25

申请号：US13742657

申请日：2013-01-16

Applicant: SHOWA DENKO K.K.

Inventor： Makoto HIWATARI ,  Akira YAMANE ,  Tomoo SHIGE ,  Akira SAKAWAKI

IPC: G11B5/84

CPC classification number: G11B5/84 ,  G11B5/3116 ,  G11B5/3163 ,  G11B5/855 ,  H01L21/31116 ,  Y10T29/49046 ,  Y10T29/49048

Abstract: A method of manufacturing a magnetic recording medium is provided. The method includes: forming a magnetic layer 2 on a non-magnetic substrate 1; forming a mask layer 3 on the magnetic layer 2; forming a resist layer 4 which is patterned into a predetermined shape on the mask layer 3; patterning the mask layer 3 into a shape corresponding to the resist layer 4 using the resist layer 4; patterning the magnetic layer 2 into a shape corresponding to the mask layer 3 using the patterned mask layer 3; and removing the mask layer 3 that remains on the magnetic layer 2 by reactive plasma etching. The reactive plasma etching is performed under an atmosphere containing an organic compound having at least one kind or plural kinds of functional groups selected from a hydroxyl group, a carbonyl group, a hydroxy carbonyl group, an alkoxy group, and an ether group.

Abstract translation: 提供一种制造磁记录介质的方法。 该方法包括：在非磁性基板1上形成磁性层2; 在磁性层2上形成掩模层3; 在掩模层3上形成图案化为规定形状的抗蚀剂层4; 使用抗蚀剂层4将掩模层3图案化成与抗蚀剂层4相对应的形状; 使用图案化掩模层3将磁性层2图案化成与掩模层3相对应的形状; 以及通过反应性等离子体蚀刻去除残留在磁性层2上的掩模层3。 活性等离子体蚀刻在含有选自羟基，羰基，羟基羰基，烷氧基和醚基中的至少一种或多种官能团的有机化合物的气氛下进行。