公开(公告)号：US20220326614A1

公开(公告)日：2022-10-13

申请号：US17596046

申请日：2020-06-03

Applicant: SHOWA DENKO K.K.

Inventor： Yasuhiro ISHIDA ,  Kentaro FURUE ,  Yoshikazu ARAI ,  Mitsuhiro IWASAKI ,  Hideo HORIBE

IPC: G03F7/039 ,  H01L51/00 ,  H01L51/52

Abstract: Provided is a high-sensitive photosensitive resin composition which contains a black colorant and by which development and pattern formation are possible even with a low exposure amount. A positive-type photosensitive resin composition according to one embodiment contains: a first resin (A) having a plurality of phenolic hydroxyl groups, at least some of which are protected with an acid-labile group; a second resin (B) having an epoxy group and a phenolic hydroxyl group; at least one colorant (C) selected from the group consisting of a black dye and a black pigment; and a photoacid generator (D).