公开(公告)号：US20040143805A1

公开(公告)日：2004-07-22

申请号：US10699613

申请日：2003-10-30

Applicant: STMICROELECTRONICS S.A.

Inventor： Arnaud Deleule

IPC: G06F009/45 ,  H01L029/06

CPC classification number: G03F1/38 ,  H01L23/544 ,  H01L2223/5444 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A device for determining the version of metal mask utilized for producing a given metal layer (Metal3) in an integrated circuit including a plurality of metal layers (Meta0, . . . , Metal3), and any modification made to the given metal layer (Metal3) requiring generation of a new version of the corresponding metal mask. The device includes a cell (Cell) integrated into the metal layer (Metal3) including at least a first voltage source (Vdd) for supplying a first voltage level, at least a second voltage source (GND) for supplying a second voltage level, and an output bus composed of at least one conductor wire (S1, S2) connected selectively to one of the first and second voltage sources as a function of the version of metal mask used to produce the metal layer, so as to generate a binary output signal representative of the mask version utilized.

Abstract translation: 一种用于确定用于在包括多个金属层（Meta0，...，Metal3）的集成电路中制造给定金属层（Metal3）的金属掩膜版本的装置，以及对给定金属层（Metal3 ）需要产生相应金属掩模的新版本。 该装置包括集成到金属层（Metal3）中的单元（Cell），其包括用于提供第一电压电平的至少第一电压源（Vdd），用于提供第二电压电平的至少第二电压源（GND）;以及 一个输出总线，其由至少一个导体线（S1，S2）组成，该导体线选择性地连接到第一和第二电压源中的一个，作为用于产生金属层的金属掩模的形式的函数，以便产生二进制输出信号 代表使用的掩模版本。