公开(公告)号：US20040185598A1

公开(公告)日：2004-09-23

申请号：US10739871

申请日：2003-12-18

Applicant: STMICROELECTRONICS SA

Inventor： Baudoin Lecohier ,  Brendan Dunne

IPC: H01L021/00

CPC classification number: H01L27/146 ,  H01L31/02162 ,  H01L31/02327 ,  H01L31/18

Abstract: The invention relates to a to a process for making a semiconductor color image sensor cell comprising a metal layer in which a fixed contact is defined, an anti-reflecting layer covering the metal layer and a passivation layer covering the assembly. The method includes etching the passivation layer and stopping on the anti-reflecting layer so as to form a hole for the opening of the fixed contact; forming at least one colored filter element on a region of the passivation layer, the anti-reflecting layer then acting as a protection layer for the surface of the fixed contact; depositing a planarizing resin layer so as to cover the colored filter elements; forming micro-lenses on the planarizing resin layer above the colored filter elements; and etching the anti-reflecting layer to open the fixed contact.

Abstract translation: 本发明涉及一种制造半导体彩色图像传感器单元的方法，该单元包括限定有固定触点的金属层，覆盖金属层的抗反射层和覆盖该组件的钝化层。 该方法包括蚀刻钝化层并停止在抗反射层上，以便形成用于打开固定触点的孔; 在钝化层的区域上形成至少一个有色过滤元件，然后防反射层充当固定触点表面的保护层; 沉积平坦化树脂层以覆盖着色滤色器元件; 在着色过滤元件上方的平坦化树脂层上形成微透镜; 并且蚀刻抗反射层以打开固定触点。