APPARATUS FOR MANUFACTURING DISPLAY DEVICE

    公开(公告)号:US20250031559A1

    公开(公告)日:2025-01-23

    申请号:US18774172

    申请日:2024-07-16

    Abstract: An apparatus for manufacturing a display device includes: a substrate; a nozzle including a nozzle hole that sprays a deposition material on the substrate; a crucible connected to the nozzle, the crucible storing the deposition material; a reflector disposed on the crucible, the reflector including an opening area overlapping the nozzle; and an angle control member connected to the reflector. The angle control member includes a first member disposed to face the nozzle, a third member disposed to face the substrate, and a second member disposed between the first member and the third member.

    DEPOSITION APPARATUS
    2.
    发明公开

    公开(公告)号:US20240068084A1

    公开(公告)日:2024-02-29

    申请号:US18239101

    申请日:2023-08-28

    CPC classification number: C23C14/24 C23C14/042 H10K59/12

    Abstract: A deposition apparatus includes: a chamber; a deposition source disposed in the chamber to include nozzles arranged in a first direction; and a deposition angle limiter disposed on the deposition source in the chamber. The deposition angle limiter includes: a low-incident angle limiting plate disposed between adjacent first and second nozzles among the nozzles and spaced apart from the first nozzle by a first height in a height direction intersecting the first direction; and a high-incident angle limiting plate surrounding at least a portion of the first nozzle and spaced apart from the first nozzle by a second height in the height direction. The first nozzle extends in the height direction.

    DEPOSITION APPARATUS AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAME

    公开(公告)号:US20170253958A1

    公开(公告)日:2017-09-07

    申请号:US15267399

    申请日:2016-09-16

    CPC classification number: C23C14/243 H01L51/001

    Abstract: A method of manufacturing a display device includes providing a deposition source and a substrate facing each other, the deposition source including a rotating rod, an internal module engaged with the rotating rod and having a storage unit for storing a deposition material, and an external housing covering the rotating rod and the internal module and having an outlet communicating with ambient air, rotating the rotating rod in the deposition source, such that the internal module engaged with the rotating rod is rotated, and applying the deposition material discharged through the outlet of the external housing onto the substrate.

    ELECTROSTATIC CHUCK
    4.
    发明申请
    ELECTROSTATIC CHUCK 有权
    静电卡

    公开(公告)号:US20160126124A1

    公开(公告)日:2016-05-05

    申请号:US14740799

    申请日:2015-06-16

    CPC classification number: H01L21/6833 Y10T279/23

    Abstract: An electrostatic chuck is disclosed. In one aspect, the electrostatic chuck includes a top plate, wherein first and second regions adjacent to each other are formed at a surface of the top plate. The electrostatic chuck also includes a first absorption plate positioned at the first region and a second absorption plate positioned at the second region to be separated from the first absorption plate. The first and second absorption plates are configured to support the absorption target.

    Abstract translation: 公开了一种静电卡盘。 一方面,静电卡盘包括顶板,其中彼此相邻的第一和第二区域形成在顶板的表面。 静电卡盘还包括位于第一区域的第一吸收板和位于第二区域的与第一吸收板分离的第二吸收板。 第一和第二吸收板被配置成支撑吸收靶。

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