公开(公告)号：US20250147425A1

公开(公告)日：2025-05-08

申请号：US18934215

申请日：2024-10-31

Applicant: Samsung Display Co., LTD. ,  ENF TECHNOLOGY CO., LTD.

Inventor： KYU-SOON PARK ,  YOUNGROK KIM ,  JONG-HYUN CHOUNG ,  WOOJIN CHO ,  Sehoon KIM ,  Jongmo PARK ,  Joonsik YOON ,  Jangwoo CHO

IPC: G03F7/42 ,  C11D3/20 ,  C11D3/30 ,  C11D3/32 ,  G03F7/30

Abstract: Provided is a stripper composition and a method for forming a pattern using the same. The stripper composition includes, in set content ranges, an amine compound, a glycol compound, an aprotic polar solvent excluding N-methyl-2-pyrrolidone and N-methylformamide, and a first corrosion inhibitor represented by Formula 1. The stripper composition according to an embodiment may be used in a process of removing a photoresist pattern formed on a lower film, and may supply characteristics of an excellent stripping power for photoresist and prevention or reduction of damage of the lower film.