公开(公告)号：US20200273943A1

公开(公告)日：2020-08-27

申请号：US16871185

申请日：2020-05-11

Applicant: Samsung Display Co., Ltd.

Inventor： JAEWOO JEONG ,  HYUNGUE KIM ,  JONGJUN BAEK

IPC: H01L27/32 ,  H01L27/12 ,  H01L21/3213 ,  H01L21/311 ,  H01L51/00 ,  H01L51/52 ,  H01L21/027

Abstract: A method of manufacturing a backplane for a display device includes forming an insulation layer on a substrate, forming a pad electrode layer on the insulation layer, forming a photoresist pattern on the pad electrode layer in the pad region, etching the pad electrode layer and a portion of the insulation layer by the photoresist pattern as an etch-stop layer so as to simultaneously form a pad electrode and a side protection layer, the side protection layer covering a sidewall of the pad electrode, and stripping the photoresist pattern.

公开(公告)号：US20180144950A1

公开(公告)日：2018-05-24

申请号：US15715495

申请日：2017-09-26

Applicant: Samsung Display Co., Ltd.

Inventor： JAEWOO JEONG ,  HYUNGUE KIM ,  JONGJUN BAEK

IPC: H01L21/3213 ,  H01L27/12

Abstract: A method of manufacturing a backplane for a display device includes forming an insulation layer on a substrate, forming a pad electrode layer on the insulation layer, forming a photoresist pattern on the pad electrode layer in the pad region, etching the pad electrode layer and a portion of the insulation layer by the photoresist pattern as an etch-stop layer so as to simultaneously form a pad electrode and a side protection layer, the side protection layer covering a sidewall of the pad electrode, and stripping the photoresist pattern.