DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20240355830A1

    公开(公告)日:2024-10-24

    申请号:US18759397

    申请日:2024-06-28

    IPC分类号: H01L27/12 H01L29/66

    摘要: A display device may include a substrate, a buffer layer on the substrate, a first active pattern on the buffer layer, the first active pattern having a first thickness, a second active pattern on the buffer layer spaced from the first active pattern and having a second thickness smaller than the first thickness, a first gate insulating layer on the first active pattern and the second active pattern, a first gate electrode on the first gate insulating layer, the first gate electrode overlapping the first active pattern, and a second gate electrode on the first gate insulating layer, the second gate electrode overlapping the second active pattern.

    DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20230215871A1

    公开(公告)日:2023-07-06

    申请号:US18184639

    申请日:2023-03-15

    IPC分类号: H01L29/66

    CPC分类号: H01L29/6675

    摘要: A display device may include a substrate, a buffer layer on the substrate, a first active pattern on the buffer layer, the first active pattern having a first thickness, a second active pattern on the buffer layer spaced from the first active pattern and having a second thickness smaller than the first thickness, a first gate insulating layer on the first active pattern and the second active pattern, a first gate electrode on the first gate insulating layer, the first gate electrode overlapping the first active pattern, and a second gate electrode on the first gate insulating layer, the second gate electrode overlapping the second active pattern.

    BACKPLANE FOR DISPLAY DEVICE AND METHOD OF MANUFACTURING THE SAME

    公开(公告)号:US20180144950A1

    公开(公告)日:2018-05-24

    申请号:US15715495

    申请日:2017-09-26

    IPC分类号: H01L21/3213 H01L27/12

    摘要: A method of manufacturing a backplane for a display device includes forming an insulation layer on a substrate, forming a pad electrode layer on the insulation layer, forming a photoresist pattern on the pad electrode layer in the pad region, etching the pad electrode layer and a portion of the insulation layer by the photoresist pattern as an etch-stop layer so as to simultaneously form a pad electrode and a side protection layer, the side protection layer covering a sidewall of the pad electrode, and stripping the photoresist pattern.

    LASER IRRADIATION APPARATUS AND LASER IRRADIATION METHOD

    公开(公告)号:US20220084823A1

    公开(公告)日:2022-03-17

    申请号:US17404231

    申请日:2021-08-17

    IPC分类号: H01L21/02 G02B26/10 G02B5/04

    摘要: A laser irradiation apparatus includes a laser light source which emits a laser beam, a first lens through which the laser beam emitted from the laser light source passes, a first scanner which reflects the laser beam passing through the first lens and changes a direction of the laser beam, a second scanner which reflects the laser beam deflected by the first scanner and changes a direction of the laser beam, a plurality of second lenses through which the laser beam deflected by the second scanner passes, where at least one of the plurality of second lenses is configured to vibrate in one direction, and an optical element through which the laser beam passing through the plurality of second lenses passes, where the optical element is configured to correct an incident angle of the laser beam incident a substrate.