公开(公告)号：US20140127612A1

公开(公告)日：2014-05-08

申请号：US13856477

申请日：2013-04-04

Applicant: Industry-Academic Cooperation Foundation, Yonsei University ,  SAMSUNG DISPLAY CO., LTD.

Inventor： Min KANG ,  Bong-Yeon KIM ,  Jeong Won KIM ,  Hyang-Shik KONG ,  Jin Ho JU ,  Kyoung Sik KIM ,  Seung Hwa BAEK ,  Jun Hyuk WOO ,  Hyun Joo LEE

IPC: G03F1/38 ,  G03F7/20

CPC classification number: G03F1/38 ,  G03F1/50

Abstract: A photomask for exposure includes: a transparent substrate; a light blocking pattern layer positioned on the transparent substrate; a first dielectric layer positioned on the light blocking pattern layer and including a dielectric material; and a negative refractive index layer positioned on the first dielectric layer and including a metal. A surface plasmon quasi-bound mode of the photomask for exposure overlaps a wavelength range of the light source of the light exposer which irradiates light to the photomask for exposure.

Abstract translation: 用于曝光的光掩模包括：透明基板; 位于所述透明基板上的遮光图案层; 位于所述遮光图案层上并包括电介质材料的第一电介质层; 以及负折射率层，其位于所述第一电介质层上并且包括金属。 用于曝光的光掩模的表面等离子体激元准结合模式与将光照射到光掩模进行曝光的光曝光器的光源的波长范围重叠。

公开(公告)号：US20140162177A1

公开(公告)日：2014-06-12

申请号：US14180234

申请日：2014-02-13

Applicant: Samsung Display Co., Ltd.

Inventor： Bong-Yeon KIM ,  Min KANG ,  Jeong Won KIM ,  Jin Ho JU ,  Jun Hyuk WOO ,  Hyun Joo LEE

IPC: G03F1/38

CPC classification number: G03F1/32 ,  G03F1/38

Abstract: An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 μm, and a transmission ratio of the halftone layer may range from about 10% to about 50%.

Abstract translation: 提供了用于形成图案的光学掩模。 光掩模包括：基板，其包括形成在基板的部分上的遮光图案，其中遮光图案包括形成在半色调层上的半色调层和遮光层，并且半色调层和遮光层与该重叠部分重叠 至少露出半色调层的边缘部分。 遮光图案的间距可以为约6μm，并且网版层的透射率可以在约10％至约50％的范围内。