公开(公告)号：US20240279802A1

公开(公告)日：2024-08-22

申请号：US18508704

申请日：2023-11-14

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jung-Min LEE ,  Gi Duck KWEON ,  Dae Ki KIM ,  Hang Kyu SONG ,  Hyun Tae YANG ,  Byoung Kwon YEO ,  Byeong Ho WOO ,  Jae Sung YU ,  Jung Bae CHOI

IPC: C23C16/44 ,  C23C16/455

CPC classification number: C23C16/4405 ,  C23C16/4408 ,  C23C16/4557

Abstract: Provided are a process chamber cleaning apparatus and method in which the inside of a process chamber may be cleaned without damaging to an inner wall or a component of the process chamber. The process chamber cleaning apparatus comprising: a chamber housing; a substrate support installed inside the chamber housing, supporting a plurality of semiconductor substrates; a gas supply providing process gases; a first gas injector installed inside the chamber housing, connected to the gas supply, injecting etch gas, which is one of the process gases, into the chamber housing; and a controller controlling operations of the gas supply and the first gas injector, wherein the first gas injector injects the etch gas in a direction twisted at a predetermined angle from a central direction of the chamber housing.