公开(公告)号：US20230037038A1

公开(公告)日：2023-02-02

申请号：US17702105

申请日：2022-03-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Byoungcheol HWANG ,  Sangwook LEE ,  Sunghyup KIM ,  Keonwoo KIM ,  Junyoung CHOI ,  Sanghoon CHEONG

IPC: C23C16/455 ,  C23C16/458

Abstract: A deposition apparatus, includes a chamber having at least one first gas inlet therein. A fixed chuck is installed in the chamber and an electrostatic chuck is installed on the fixed chuck. An edge ring is disposed on an edge of the electrostatic chuck. A shower head is disposed above the edge ring. A baffle is disposed above the shower head and an upper electrode is disposed above the baffle. A gas guide member is disposed above the upper electrode so that a flow path provided in the upper electrode and the first gas inlet are connected. The gas guide member has a flow path hole penetrating in upward and downward directions, and a plurality of guide holes are provided on an inner surface of the gas guide member.