公开(公告)号：US20230042743A1

公开(公告)日：2023-02-09

申请号：US17679749

申请日：2022-02-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sukjong Bae ,  Johan Hofkens ,  Haifeng Yuan ,  Flip de Jong

IPC: G03F1/86 ,  G03F7/20 ,  G01N21/64

Abstract: According to example embodiments, there is provided a photoresist inspection method. The photoresist inspection method includes: providing a photoresist on a substrate; irradiating the photoresist with an electron beam and an excitation beam; detecting fluorescent light generated by the photoresist in response to the excitation beam; and evaluating the photoresist based on the fluorescent light.

公开(公告)号：US12276907B2

公开(公告)日：2025-04-15

申请号：US17679749

申请日：2022-02-24

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sukjong Bae ,  Johan Hofkens ,  Haifeng Yuan ,  Flip de Jong

IPC: G03F7/20 ,  G01N21/64 ,  G03F1/86 ,  G03F7/00 ,  G03F7/22 ,  G01N21/956

Abstract: According to example embodiments, there is provided a photoresist inspection method. The photoresist inspection method includes: providing a photoresist on a substrate; irradiating the photoresist with an electron beam and an excitation beam; detecting fluorescent light generated by the photoresist in response to the excitation beam; and evaluating the photoresist based on the fluorescent light.