公开(公告)号：US20230087015A1

公开(公告)日：2023-03-23

申请号：US17993588

申请日：2022-11-23

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Dongjun KIM ,  Hun KANG ,  Kihwan KWON ,  Kyoungwoung KIM

IPC: A47L9/04

Abstract: A vacuum cleaner including a cleaner body including a motor configured to generate a suction force and a foreign substance collection chamber; and a suction head connected to the cleaner body. The suction head may include a drum brush, a one-way roller disposed in front of the drum brush, and a housing having a suction port. The drum brush and the one-way roller may be configured so that, when the suction head is moving forward on a surface to be cleaned, the drum brush and the one-way roller rotate so that foreign substances on the surface are suctioned by the suction force into the housing through the suction port to be guided to the foreign substance collection chamber, and when the suction head is moving rearward on the surface, rotation of the one-way roller is restricted to prevent the foreign substances suctioned into the housing from being discharged outside of the housing of the suction head through the suction port.

公开(公告)号：US20240315504A1

公开(公告)日：2024-09-26

申请号：US18413870

申请日：2024-01-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hun KANG ,  Kihwan KWON ,  Hansaem LEE ,  Dongjun KIM ,  Hyeoncheol KIM ,  Jiwon CHOI

IPC: A47L9/04 ,  A47L9/28

CPC classification number: A47L9/0477 ,  A47L9/2889

Abstract: A cleaning device includes a suction device configured to suck a pollutant into the suction device; a body configured to collect the sucked pollutant, wherein the suction device includes: a drum rotatable around an axis and having a hollow portion, a driving motor disposed in the hollow portion of the drum and configured to apply a rotational force to the drum to rotate the drum around the axis, a rotatable chamber surrounding the driving motor and disposed between the drum and the driving motor, the rotatable chamber rotatable coaxially with the axis and configured to rotate with the drum so that a cooling fluid between the driving motor and the rotatable chamber spirals around the driving motor when the drum is rotated, and a cooling fluid discharge hole at an end of the rotatable chamber to discharge the cooling fluid outside of the rotatable chamber.

公开(公告)号：US20230090738A1

公开(公告)日：2023-03-23

申请号：US17865946

申请日：2022-07-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Hun KANG ,  Kihwan KWON ,  Kyoungwoung KIM ,  Dongjun KIM

IPC: A47L9/04 ,  A47L5/30 ,  A46B13/00 ,  A46B13/02 ,  A46B9/00 ,  A46B9/02 ,  A46D1/00 ,  A46B9/12

Abstract: A cleaner includes a main body and a suction head connected to the main body to suck foreign objects into the main body therethrough, the suction head including a housing including a suction port, and a drum module disposed in the housing, and to be rotated to scatter the foreign objects to be sucked through the suction port so that the scattered foreign objects are drawn into the housing through the suction port, and the drum module including a drum body, a first blade coupled to outer circumference of the drum body, a second blade separated from the first blade in a circumferential direction of the drum body and having a mass greater than a mass of the first blade, and a mass compensation member arranged on the outer circumference of the drum body to compensate for a difference in mass between the first blade and the second blade.

公开(公告)号：US20250028235A1

公开(公告)日：2025-01-23

申请号：US18643392

申请日：2024-04-23

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Heungsuk OH ,  Hun KANG ,  Sangwook KIM ,  Sanghun KIM ,  Sujin OH ,  Jinseok OH

IPC: G03F1/36 ,  G03F1/70 ,  G06F30/392 ,  G06F119/18

Abstract: Provided are an optical proximity correction (OPC) method capable of maintaining full-chip bias consistency and a mask manufacturing method including the OPC method. The OPC method includes obtaining a first optical proximity corrected (OPCed) design layout by implementing a first OPC on an OPC target design layout; performing a reverse dissection on the OPC target design layout based on the first OPCed design layout to generate first segments; performing a reverse correction to allocate first biases of the first OPCed design layout to the first segments of the OPC target design layout; determining a full-chip representative bias based on a segment grouping of the first segments; applying the full-chip representative bias to an entire chip area; preparing mask data based on the full-chip representative bias that has been applied to the entire chip area; and exposing a mask substrate based on the mask data.