公开(公告)号：US20240274453A1

公开(公告)日：2024-08-15

申请号：US18440649

申请日：2024-02-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minhong YUN ,  Shigenobu MAEDA ,  Kyungtae KIM ,  Donghyun KIM ,  Sangyoon PARK

IPC: H01L21/67 ,  G05B13/02

CPC classification number: H01L21/67288 ,  G05B13/027 ,  H01L21/67248 ,  H01L21/67253 ,  H01L21/67276

Abstract: A semiconductor production system includes: a first chamber that is configured to be set to a first setting value and process wafers; a second chamber that is configured to be set to a second setting value and process the wafers processed in the first chamber; and a fault detection and classification (FDC) modeling module configured to: train a first FDC machine learning model to generate, based on the first setting value and first FDC values sensed with respect to the wafers processed in the first chamber, first predicted FDC values with respect to first virtual wafers in the first chamber; and train a second FDC machine learning model to generate, based on the second setting value and second FDC values sensed with respect to the wafers processed in the second chamber, second predicted FDC values with respect to second virtual wafers in the second chamber.