公开(公告)号：US20200152469A1

公开(公告)日：2020-05-14

申请号：US16426117

申请日：2019-05-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jin SHIN ,  Woo-Mok SON ,  Nam-Hoon LEE ,  Dong-Eog KIM ,  Seung-Hun OH ,  Eun-Seok LEE ,  Young-Seok JANG

IPC: H01L21/304 ,  H01L21/02 ,  H01L21/66

Abstract: In a method of manufacture, a displacement sensor is provided over a conditioner disk. The conditioner disk is rotated to perform a conditioning process on a polishing surface of a polishing pad. A displacement of the rotating conditioner disk is detected using the displacement sensor during the conditioning process. A height of the conditioner disk is calculated from the detected displacement. An end point of the conditioning process is determined on the polishing surface based on the calculated height.

公开(公告)号：US20220093405A1

公开(公告)日：2022-03-24

申请号：US17544990

申请日：2021-12-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jin SHIN ,  Woo-Mok SON ,  Nam-Hoon LEE ,  Dong-Eog KIM ,  Seung-Hun OH ,  Eun-Seok LEE ,  Young-Seok JANG

IPC: H01L21/304 ,  H01L21/02 ,  H01L21/66

Abstract: In a method of manufacture, a displacement sensor is provided over a conditioner disk. The conditioner disk is rotated to perform a conditioning process on a polishing surface of a polishing pad. A displacement of the rotating conditioner disk is detected using the displacement sensor during the conditioning process. A height of the conditioner disk is calculated from the detected displacement. An end point of the conditioning process is determined on the polishing surface based on the calculated height.

公开(公告)号：US20160144392A1

公开(公告)日：2016-05-26

申请号：US14809548

申请日：2015-07-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seung-Min RYU ,  Bo-Kyung JUNG ,  Kwang-Hyuk CHOI ,  Nam-Hoon LEE ,  Jong-Hyun LEE ,  Jin SHIN ,  Kyeong-Min YEO ,  Jong-Han OH

IPC: B05B15/04 ,  B05B12/00

CPC classification number: H01L51/0011 ,  C23C14/042 ,  C23C14/50 ,  C23C14/54

Abstract: An apparatus for organic layer deposition is provided that can improve precision of a gap between a substrate and a mask by correcting a position of a mask stage having a mask mounted thereon based on a substrate shape, and that can reduce a measurement error of a mask surface by pre-measuring a position of a mask and determining an initial position of the mask based on the measured position. The apparatus includes a shape measuring sensor, a substrate carrier, a deposition material discharge source, a mask including a plurality of pattern slits, a camera measuring an alignment error between the substrate and the mask, a distance measuring sensor measuring an alignment error between the substrate and the mask, and a mask stage controlling a position of the mask.

Abstract translation: 提供一种有机层沉积装置，其可以通过基于衬底形状校正其上安装有掩模的掩模台的位置来提高基板和掩模之间的间隙的精度，并且可以减少掩模的测量误差 通过预先测量掩模的位置并基于所测量的位置确定掩模的初始位置。 该装置包括形状测量传感器，衬底载体，沉积材料放电源，包括多个图案狭缝的掩模，测量衬底和掩模之间的对准误差的照相机，测量在衬底和掩模之间的对准误差的距离测量传感器 衬底和掩模，以及控制掩模位置的掩模台。