公开(公告)号：US20190330741A1

公开(公告)日：2019-10-31

申请号：US16212036

申请日：2018-12-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jong-Hyun LEE ,  Young-Kwon KIM ,  Woo-Jae KIM ,  Seung-Min RYU ,  Ji-Ho UH

IPC: C23C16/52 ,  C23C16/455 ,  H01L21/67 ,  H01L21/673 ,  C23C16/02

Abstract: A gas injector includes first and second gas introduction passages extending in a first direction toward a central axis of a process chamber respectively, a first bypass passage extending from the first gas introduction passage in a second direction that is substantially perpendicular to the first direction, a second bypass passage extending from the second gas introduction passage in a reverse direction to the second direction, a first distribution passage isolated from the first bypass passage in the first direction and extending from an outlet of the first bypass passage in the reverse direction to the second direction, a second distribution passage isolated from the second bypass passage in the first direction and extending from an outlet of the second bypass passage in the second direction, and a plurality of spray holes in an outer surface of the first and second distribution passages and configured to spray the process gas.

公开(公告)号：US20160144392A1

公开(公告)日：2016-05-26

申请号：US14809548

申请日：2015-07-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seung-Min RYU ,  Bo-Kyung JUNG ,  Kwang-Hyuk CHOI ,  Nam-Hoon LEE ,  Jong-Hyun LEE ,  Jin SHIN ,  Kyeong-Min YEO ,  Jong-Han OH

IPC: B05B15/04 ,  B05B12/00

CPC classification number: H01L51/0011 ,  C23C14/042 ,  C23C14/50 ,  C23C14/54

Abstract: An apparatus for organic layer deposition is provided that can improve precision of a gap between a substrate and a mask by correcting a position of a mask stage having a mask mounted thereon based on a substrate shape, and that can reduce a measurement error of a mask surface by pre-measuring a position of a mask and determining an initial position of the mask based on the measured position. The apparatus includes a shape measuring sensor, a substrate carrier, a deposition material discharge source, a mask including a plurality of pattern slits, a camera measuring an alignment error between the substrate and the mask, a distance measuring sensor measuring an alignment error between the substrate and the mask, and a mask stage controlling a position of the mask.

Abstract translation: 提供一种有机层沉积装置，其可以通过基于衬底形状校正其上安装有掩模的掩模台的位置来提高基板和掩模之间的间隙的精度，并且可以减少掩模的测量误差 通过预先测量掩模的位置并基于所测量的位置确定掩模的初始位置。 该装置包括形状测量传感器，衬底载体，沉积材料放电源，包括多个图案狭缝的掩模，测量衬底和掩模之间的对准误差的照相机，测量在衬底和掩模之间的对准误差的距离测量传感器 衬底和掩模，以及控制掩模位置的掩模台。

公开(公告)号：US20170037537A1

公开(公告)日：2017-02-09

申请号：US15204994

申请日：2016-07-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seung-Min RYU ,  Sang Min LEE ,  HEE JONG JEONG ,  CHAEHO KIM ,  Ji Su SON ,  JAEBONG LEE ,  JUWAN LIM ,  JUNGWOO CHOI

IPC: C30B25/16 ,  C30B25/12 ,  C30B25/10 ,  C30B25/14 ,  C23C16/455 ,  C30B29/10 ,  C23C16/458 ,  C23C16/50 ,  C23C16/44 ,  C30B25/08 ,  C30B29/06

CPC classification number: C30B25/16 ,  C23C16/4584 ,  C23C16/4585 ,  C23C16/481 ,  C23C16/52 ,  C30B25/105

Abstract: An apparatus is provided for depositing a thin film. The apparatus includes a chamber, a susceptor disposed in the chamber and supporting a substrate, a reflection housing disposed outside the chamber, a light source unit disposed in the reflection housing and irradiating light to the susceptor, and a light controlling unit blocking at least a portion of an irradiation path of the light to control an irradiation area of the light on the susceptor. At least a portion of the light controlling unit is disposed in the reflection housing.

Abstract translation: 提供了一种用于沉积薄膜的装置。 该装置包括：室，设置在室中的基座和支撑基板;设置在室外的反射壳体;设置在反射壳体中并将光照射到基座的光源单元;以及光控制单元， 光的照射路径的一部分，以控制基座上的光的照射面积。 光控制单元的至少一部分设置在反射壳体中。

公开(公告)号：US20210175073A1

公开(公告)日：2021-06-10

申请号：US17022198

申请日：2020-09-16

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Seung-Min RYU ,  Jiyu CHOI ,  Gyu-Hee PARK ,  Younjoung CHO

IPC: H01L21/02 ,  C23C16/18 ,  C23C16/455 ,  C23C16/08 ,  C23C16/30 ,  C07C211/08 ,  C01G19/00

Abstract: A method of manufacturing a semiconductor device includes providing a metal precursor on a substrate, and providing a reactant and a co-reactant to form a metal nitride layer by reaction with the metal precursor, the reactant being a nitrogen source, the co-reactant being an organometallic compound represented by Chemical Formula 1: M2L1)n  [Chemical Formula 1] In Chemical Formula 1, M2 may be selected from Sn, In, and Ge, n may be 2, 3, or 4, and each L1 may independently be hydrogen, a halogen, or a group represented by Chemical Formula 2. In Chemical Formula 2, x may be 0, 1, 2, 3, 4, or 5 and y may be 0 or 1. When x is 0, y may be 1. R1, R2, R3, and R4 may each independently be hydrogen, an alkyl group having 1 to 5 carbons, or an aminoalkyl group having 1 to 5 carbons.

公开(公告)号：US20200231610A1

公开(公告)日：2020-07-23

申请号：US16554926

申请日：2019-08-29

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Seung-Min RYU ,  Myong Woon KIM ,  Younsoo KIM ,  Sang Ick LEE ,  Jaesoon LIM ,  Younjoung CHO ,  Jun Hee CHO ,  Won Mook CHAE

IPC: C07F7/22 ,  C23C16/40 ,  C23C16/448 ,  H01L21/02 ,  H01L21/285

Abstract: A tin compound, a tin precursor compound for forming a tin-containing layer, and a method of forming a thin layer, the tin compound being represented by Formula 1: wherein R1, R2, R3, R4, R5, R6, and R7 are each independently hydrogen, a linear alkyl group having 1 to 4 carbon atoms, or a branched alkyl group having 3 or 4 carbon atoms.