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公开(公告)号：US09981051B2
公开(公告)日：2018-05-29
申请号：US14012637
申请日：2013-08-28
Applicant: Sensor Electronic Technology, Inc.
Inventor： Michael Shur , Maxim Shatalov , Timothy James Bettles , Yuri Bilenko , Saulius Smetona , Alexander Dobrinsky , Remigijus Gaska
CPC classification number: A61L2/10 , F25D17/042 , F25D2317/0417
Abstract: Systems and methods for disinfecting a storage area and/or items within a storage area can include at least one ultraviolet radiation source configured to generate ultraviolet radiation directed within a storage area and a monitoring and control system. The monitoring and control system can be configured to monitor at least one of the storage area or a set of items located in the storage area and control ultraviolet radiation generated by the at least one ultraviolet radiation source based on the monitoring by delivering targeted ultraviolet radiation to at least one designated zone within the storage area.
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公开(公告)号：US09795699B2
公开(公告)日：2017-10-24
申请号：US14012667
申请日：2013-08-28
Applicant: Sensor Electronic Technology, Inc.
Inventor： Michael Shur , Maxim Shatalov , Timothy James Bettles , Yuri Bilenko , Saulius Smetona , Alexander Dobrinsky , Remigijus Gaska
CPC classification number: A61L2/10 , A61L2202/14 , A61L2202/21 , F25D17/042 , F25D27/005 , F25D2317/0417
Abstract: Ultraviolet radiation is directed within an area at target wavelengths and/or target intensities. The target wavelength ranges and/or target intensity ranges of the ultraviolet radiation sources can correspond to at least one of a plurality of selectable operating configurations including a storage life preservation operating configuration, a disinfection operating configuration, and an ethylene decomposition operating configuration.
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公开(公告)号：US09267770B2
公开(公告)日：2016-02-23
申请号：US13625363
申请日：2012-09-24
Applicant: Sensor Electronic Technology, Inc.
Inventor： Remigijus Gaska , Alexander Dobrinsky , Maxim Shatalov , Michael Shur
Abstract: An emitting structure for simulating an irradiance signature of a missile is provided. The emitting structure includes one or more radiation sources, each of which includes at least one ultraviolet radiation source and at least one infrared radiation source. The emitting structure also includes a spherical shell and a mechanism for positioning the radiation source(s) along a three dimensional boundary of the spherical shell. The emitting structure can locate and operate one of the radiation sources to simulate the irradiance signature of the missile.
Abstract translation: 提供了用于模拟导弹的辐照度特征的发射结构。 发射结构包括一个或多个辐射源，每个辐射源包括至少一个紫外辐射源和至少一个红外辐射源。 发射结构还包括球壳和用于沿着球壳的三维边界定位辐射源的机构。 发射结构可以定位和操作其中一个辐射源，以模拟导弹的辐照度特征。
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公开(公告)号：US20140060104A1
公开(公告)日：2014-03-06
申请号：US14012637
申请日：2013-08-28
Applicant: Sensor Electronic Technology, Inc.
Inventor： Michael Shur , Maxim Shatalov , Timothy James Bettles , Yuri Bilenko , Saulius Smetona , Alexander Dobrinsky , Remigijus Gaska
IPC: A61L2/10
CPC classification number: A61L2/10 , F25D17/042 , F25D2317/0417
Abstract: Ultraviolet radiation is directed within an area. The storage area is scanned and monitored for the presence of biological activity within designated zones. Once biological activity is identified, ultraviolet radiation is directed to sterilize and disinfect designated zones within the storage area.
Abstract translation: 紫外线辐射指向一个区域内。 对指定区域内的生物活性的存在进行扫描和监测。 一旦发现生物活性，紫外线辐射就被引导消毒和消毒储存区域内的指定区域。
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公开(公告)号：US20140060095A1
公开(公告)日：2014-03-06
申请号：US14012682
申请日：2013-08-28
Applicant: Sensor Electronic Technology, Inc.
Inventor： Michael Shur , Maxim Shatalov , Timothy James Bettles , Yuri Bilenko , Saulius Smetona , Alexander Dobrinsky , Remigijus Gaska
CPC classification number: A61L2/10 , A61L2202/14 , A61L2202/21 , F25D17/042 , F25D27/005 , F25D2317/0417
Abstract: Ultraviolet radiation is directed within an area. Items located within the area and/or one or more conditions of the area are monitored over a period of time. Based on the monitoring, ultraviolet radiation sources are controlled by adjusting a direction, an intensity, a pattern, and/or a spectral power of the ultraviolet radiation generated by the ultraviolet radiation source. Adjustments to the ultraviolet radiation source(s) can correspond to one of a plurality of selectable operating configurations including a storage life preservation operating configuration, a disinfection operating configuration, and an ethylene decomposition operating configuration.
Abstract translation: 紫外线辐射指向一个区域内。 在一段时间内监视位于该区域内的区域和/或该区域的一个或多个条件。 基于监测，通过调节由紫外线辐射源产生的紫外线辐射的方向，强度，图案和/或光谱功率来控制紫外线辐射源。 对紫外线辐射源的调整可以对应于多个可选操作配置中的一个，包括存储寿命保存操作配置，消毒操作配置和乙烯分解操作配置。
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Patent Agency Ranking
公开(公告)号：US09034271B2
公开(公告)日：2015-05-19
申请号：US14012682
申请日：2013-08-28
Applicant: Sensor Electronic Technology, Inc.
Inventor： Michael Shur , Maxim Shatalov , Timothy James Bettles , Yuri Bilenko , Saulius Smetona , Alexander Dobrinsky , Remigijus Gaska
CPC classification number: A61L2/10 , A61L2202/14 , A61L2202/21 , F25D17/042 , F25D27/005 , F25D2317/0417
Abstract: Ultraviolet radiation is directed within an area. Items located within the area and/or one or more conditions of the area are monitored over a period of time. Based on the monitoring, ultraviolet radiation sources are controlled by adjusting a direction, an intensity, a pattern, and/or a spectral power of the ultraviolet radiation generated by the ultraviolet radiation source. Adjustments to the ultraviolet radiation source(s) can correspond to one of a plurality of selectable operating configurations including a storage life preservation operating configuration, a disinfection operating configuration, and an ethylene decomposition operating configuration.
Abstract translation: 紫外线辐射指向一个区域内。 在一段时间内监视位于该区域内的区域和/或该区域的一个或多个条件。 基于监测，通过调节由紫外线辐射源产生的紫外线辐射的方向，强度，图案和/或光谱功率来控制紫外线辐射源。 对紫外线辐射源的调整可以对应于多个可选操作配置中的一个，包括存储寿命保存操作配置，消毒操作配置和乙烯分解操作配置。
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公开(公告)号：US20140096669A1
公开(公告)日：2014-04-10
申请号：US13625363
申请日：2012-09-24
Applicant: Sensor Electronic Technology, Inc.
Inventor： Remigijus Gaska , Alexander Dobrinsky , Maxim Shatalov , Michael Shur
Abstract: An emitting structure for simulating an irradiance signature of a missile is provided. The emitting structure includes one or more radiation sources, each of which includes at least one ultraviolet radiation source and at least one infrared radiation source. The emitting structure also includes a spherical shell and a mechanism for positioning the radiation source(s) along a three dimensional boundary of the spherical shell. The emitting structure can locate and operate one of the radiation sources to simulate the irradiance signature of the missile.
Abstract translation: 提供了用于模拟导弹的辐照度特征的发射结构。 发射结构包括一个或多个辐射源，每个辐射源包括至少一个紫外辐射源和至少一个红外辐射源。 发射结构还包括球壳和用于沿着球壳的三维边界定位辐射源的机构。 发射结构可以定位和操作其中一个辐射源，以模拟导弹的辐照度特征。
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公开(公告)号：US20140061509A1
公开(公告)日：2014-03-06
申请号：US14012644
申请日：2013-08-28
Applicant: Sensor Electronic Technology, Inc.
Inventor： Michael Shur , Maxim Shatalov , Timothy James Bettles , Yuri Bilenko , Saulius Smetona , Alexander Dobrinsky , Remigijus Gaska
IPC: A23L3/28
CPC classification number: A23L3/28 , A23L3/003 , A23L3/3409 , A61L2/10 , A61L2/24
Abstract: Ultraviolet radiation is directed within an area. The target wavelength ranges and/or target intensity ranges of the ultraviolet radiation sources can correspond to at least one of a plurality of selectable operating configurations including a sterilization operating configuration and a preservation operating configuration.
Abstract translation: 紫外线辐射指向一个区域内。 紫外线辐射源的目标波长范围和/或目标强度范围可以对应于包括灭菌操作配置和保存操作配置的多个可选操作配置中的至少一个。
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公开(公告)号：US09750830B2
公开(公告)日：2017-09-05
申请号：US14012652
申请日：2013-08-28
Applicant: Sensor Electronic Technology, Inc.
Inventor： Michael Shur , Maxim Shatalov , Timothy James Bettles , Yuri Bilenko , Saulius Smetona , Alexander Dobrinsky , Remigijus Gaska
CPC classification number: A61L2/10 , A61L2202/14
Abstract: Ultraviolet radiation is directed within an area. The target wavelength ranges and/or target intensity ranges of the ultraviolet radiation sources can correspond to at least one of a plurality of selectable operating configurations including a virus destruction operating configuration and a bacteria disinfection operating configuration. Each configuration can include a unique combination of the target wavelength range and target intensity range.
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公开(公告)号：US09179703B2
公开(公告)日：2015-11-10
申请号：US14012644
申请日：2013-08-28
Applicant: Sensor Electronic Technology, Inc.
Inventor： Michael Shur , Maxim Shatalov , Timothy James Bettles , Yuri Bilenko , Saulius Smetona , Alexander Dobrinsky , Remigijus Gaska
IPC: A23L3/28 , A23L3/3409 , A61L2/24 , A23L3/00 , A61L2/10
CPC classification number: A23L3/28 , A23L3/003 , A23L3/3409 , A61L2/10 , A61L2/24
Abstract: Ultraviolet radiation is directed within an area. The target wavelength ranges and/or target intensity ranges of the ultraviolet radiation sources can correspond to at least one of a plurality of selectable operating configurations including a sterilization operating configuration and a preservation operating configuration.
Abstract translation: 紫外线辐射指向一个区域内。 紫外线辐射源的目标波长范围和/或目标强度范围可以对应于包括灭菌操作配置和保存操作配置的多个可选操作配置中的至少一个。
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