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    TARGETED PERFORMANCE OF HYPOHALITE METHODS THEREOF
    3.
    发明申请
    TARGETED PERFORMANCE OF HYPOHALITE METHODS THEREOF 审中-公开
    具有优良性能的HYPOHALITE方法

    公开(公告)号：US20170022453A1

    公开(公告)日：2017-01-26

    申请号：US15285314

    申请日：2016-10-04

    Applicant: THE CLOROX COMPANY

    Inventor： Dewain Garner ,  William L. Smith ,  Jared Heymann

    IPC: C11D3/395 ,  A01N47/44 ,  C11D3/00 ,  A01N59/00 ,  C11D3/26 ,  C11D3/10

    CPC classification number: C11D3/3951 ,  A01N47/44 ,  A01N59/00 ,  B05C9/06 ,  B65D25/04 ,  B65D25/08 ,  B65D85/70 ,  C11D3/0042 ,  C11D3/0047 ,  C11D3/048 ,  C11D3/10 ,  C11D3/22 ,  C11D3/26 ,  C11D3/3953 ,  C11D3/3955 ,  C11D3/3956 ,  C11D3/3958 ,  C11D7/10 ,  C11D7/105 ,  C11D17/041 ,  A01N25/32

    Abstract: This invention relates to extend the benefits of using hypochlorite compounds such as sodium hypochlorite to clean and disinfect articles while reducing or eliminating the side effects of treating an article with a strong oxidant material. The invention relates to a single step process involving mixing of precursor compositions of a suitable hypohalite or hypohalous acid with a solution of a reducing agent. Optionally a buffer may be present in either or both precursor compositions, such that at time of use such active hypohalous acid concentration in the resulting aqueous mixture remains at a sufficient activity level to effect one or more desired benefits against a target substrate for a desired period of time. The oxidant is substantially consumed by reaction with the reducing agent after the time needed for achieving the desired benefit has passed.

    Abstract translation: 本发明涉及使用次氯酸钠化合物如次氯酸钠来清洁和消毒制品的优点，同时减少或消除用强氧化剂材料处理制品的副作用。 本发明涉及包括将合适的次卤酸盐或次卤酸的前体组合物与还原剂溶液混合的单步方法。 任选地，一种或两种前体组合物中可存在缓冲液，使得在使用时，所得含水混合物中的这种活性次卤酸浓度保持足够的活性水平，以在目标底物上达到所需期望的一种或多种所需益处 的时间。 在达到期望的效益所需的时间已经过去之后，氧化剂通常与还原剂反应消耗。

    TARGETED PERFORMANCE OF HYPOHALITE METHODS THEREOF
    4.
    发明申请
    TARGETED PERFORMANCE OF HYPOHALITE METHODS THEREOF 审中-公开
    具有优良性能的HYPOHALITE方法

    公开(公告)号：US20150197710A1

    公开(公告)日：2015-07-16

    申请号：US14671144

    申请日：2015-03-27

    Applicant: THE CLOROX COMPANY

    Inventor： Dewain Garner ,  William L. Smith ,  Jared Heymann

    IPC: C11D3/395 ,  C11D3/00

    CPC classification number: C11D3/3951 ,  A01N47/44 ,  A01N59/00 ,  B05C9/06 ,  B65D25/04 ,  B65D25/08 ,  B65D85/70 ,  C11D3/0042 ,  C11D3/0047 ,  C11D3/048 ,  C11D3/10 ,  C11D3/22 ,  C11D3/26 ,  C11D3/3953 ,  C11D3/3955 ,  C11D3/3956 ,  C11D3/3958 ,  C11D7/10 ,  C11D7/105 ,  C11D17/041 ,  A01N25/32

    Abstract: This invention relates to extend the benefits of using hypochlorite compounds such as sodium hypochlorite to clean and disinfect articles while reducing or eliminating the side effects of treating an article with a strong oxidant material. The invention relates to a single step process involving mixing of precursor compositions of a suitable hypohalite or hypohalous acid with a solution of a reducing agent. Optionally a buffer may be present in either or both precursor compositions, such that at time of use such active hypohalous acid concentration in the resulting aqueous mixture remains at a sufficient activity level to effect one or more desired benefits against a target substrate for a desired period of time. The oxidant is substantially consumed by reaction with the reducing agent after the time needed for achieving the desired benefit has passed.

    Abstract translation: 本发明涉及使用次氯酸钠化合物如次氯酸钠来清洁和消毒制品的优点，同时减少或消除用强氧化剂材料处理制品的副作用。 本发明涉及包括将合适的次卤酸盐或次卤酸的前体组合物与还原剂溶液混合的单步方法。 任选地，一种或两种前体组合物中可存在缓冲液，使得在使用时，所得含水混合物中的这种活性次卤酸浓度保持足够的活性水平，以在目标底物上达到所需期望的一种或多种所需益处 的时间。 在达到期望的效益所需的时间已经过去之后，氧化剂通常与还原剂反应消耗。

    TARGETED PERFORMANCE OF HYPOHALITE SYSTEMS THEREOF
    7.
    发明申请
    TARGETED PERFORMANCE OF HYPOHALITE SYSTEMS THEREOF 有权
    其HYPOHALITE系统的目标性能

    公开(公告)号：US20130216293A1

    公开(公告)日：2013-08-22

    申请号：US13672955

    申请日：2012-11-09

    Applicant: The Clorox Company

    Inventor： Dewain Garner ,  William Smith ,  Jared Heymann

    IPC: C11D3/395 ,  C11D7/10 ,  B05C9/06 ,  B65D25/08 ,  B65D85/00 ,  A01N59/00 ,  B65D25/04

    CPC classification number: C11D3/3951 ,  A01N47/44 ,  A01N59/00 ,  B05C9/06 ,  B65D25/04 ,  B65D25/08 ,  B65D85/70 ,  C11D3/0042 ,  C11D3/0047 ,  C11D3/048 ,  C11D3/10 ,  C11D3/22 ,  C11D3/26 ,  C11D3/3953 ,  C11D3/3955 ,  C11D3/3956 ,  C11D3/3958 ,  C11D7/10 ,  C11D7/105 ,  C11D17/041 ,  A01N25/32

    Abstract: This invention relates to extend the benefits of using hypochlorite compounds such as sodium hypochlorite to clean and disinfect articles while reducing or eliminating the side effects of treating an article with a strong oxidant material. The invention relates to a single step process involving mixing of precursor compositions of a suitable hypohalite or hypohalous acid with a solution of a reducing agent. Optionally a boiler may be present in either or both precursor compositions, such that at time of use such active hypohalous acid concentration, in the resulting aqueous mixture remains at a sufficient activity level to effect one or more desired benefits against a target substrate for a desired period of time. The oxidant is substantially consumed by reaction with the reducing agent after the time needed for achieving the desired benefit has passed.

    Abstract translation: 本发明涉及使用次氯酸钠化合物如次氯酸钠来清洁和消毒制品的优点，同时减少或消除用强氧化剂材料处理制品的副作用。 本发明涉及包括将合适的次卤酸盐或次卤酸的前体组合物与还原剂溶液混合的单步方法。 任选地，锅炉可以存在于前体组合物中的一种或两种中，使得在使用时使用这种活性次卤酸浓度，在所得含水混合物中保持足够的活性水平以实现针对目标底物的一种或多种期望的益处， 一段的时间。 在达到期望的效益所需的时间已经过去之后，氧化剂通常与还原剂反应消耗。

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