公开(公告)号：US20240117278A1

公开(公告)日：2024-04-11

申请号：US18526588

申请日：2023-12-01

申请人： FUJIFILM Corporation

发明人： Nobuaki SUGIMURA ,  Tetsuya Kamimura

IPC分类号： C11D3/30 ,  C11D3/00 ,  C11D3/34 ,  H01L21/02

CPC分类号： C11D3/30 ,  C11D3/0047 ,  C11D3/3472 ,  H01L21/02065 ,  H01L21/02074 ,  C11D2111/22 ,  C11D2111/44

摘要： An object of the present invention is to provide a treatment liquid having excellent removability of a hydrophobic anticorrosion agent and excellent suppression property of copper surface roughness, a cleaning method of a semiconductor substrate, and a manufacturing method of a semiconductor element. The treatment liquid of the present invention contains at least one specific compound selected from the group consisting of a quaternary ammonium compound including a quaternary ammonium cation having a total number of carbon atoms of 5 or more and a quaternary phosphonium compound including a quaternary phosphonium cation having a total number of carbon atoms of 5 or more, a sulfur-containing compound, and a solvent.

公开(公告)号：US11898123B2

公开(公告)日：2024-02-13

申请号：US17458671

申请日：2021-08-27

申请人： Fujifilm Electronic Materials U.S.A., Inc.

发明人： Emil A. Kneer ,  Thomas Dory ,  Atsushi Mizutani

IPC分类号： C11D7/32 ,  C11D3/33 ,  C11D3/00 ,  C11D3/28 ,  C11D11/00 ,  C11D3/43 ,  C11D3/34

CPC分类号： C11D3/33 ,  C11D3/0047 ,  C11D3/0073 ,  C11D3/28 ,  C11D3/3409 ,  C11D3/43 ,  C11D11/0047

摘要： This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one chelating agent, the chelating agent being a polyaminopolycarboxylic acid; 3) at least one corrosion inhibitor, the corrosion inhibitor being a substituted or unsubstituted benzotriazole; 4) at least one sulfonic acid; and 5) water.

公开(公告)号：US11718812B2

公开(公告)日：2023-08-08

申请号：US17191534

申请日：2021-03-03

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Ji Cui ,  William Weilun Hong ,  Gin-Chen Huang ,  Shich-Chang Suen ,  Kei-Wei Chen

IPC分类号： C11D3/43 ,  C11D1/40 ,  H01L29/66 ,  H01L29/78 ,  H01L21/304 ,  H01L21/306 ,  H01L21/321 ,  C11D11/00 ,  C11D3/37 ,  C11D3/30 ,  C11D3/00 ,  H01L21/02

CPC分类号： C11D1/40 ,  C11D3/0047 ,  C11D3/30 ,  C11D3/3723 ,  C11D3/3773 ,  C11D3/43 ,  C11D11/0047 ,  H01L21/02041 ,  H01L21/304 ,  H01L21/306 ,  H01L21/3212 ,  H01L29/66795 ,  H01L29/785

摘要： A cleaning composition for cleaning a surface of a substrate comprising silicon germanium after a chemical mechanical polishing process is provided. The cleaning composition includes an oligomeric or polymeric polyamine, at least one wetting agent, a pH adjusting agent, and a solvent.

公开(公告)号：US20190161706A1

公开(公告)日：2019-05-30

申请号：US16202958

申请日：2018-11-28

申请人： Korex Canada Company

发明人： Douglas Robert Watson

IPC分类号： C11D3/37 ,  C11D3/386 ,  C11D3/00 ,  C11D3/33 ,  C11D3/22 ,  C11D11/00

CPC分类号： C11D3/378 ,  C11D1/72 ,  C11D3/0047 ,  C11D3/08 ,  C11D3/10 ,  C11D3/2086 ,  C11D3/222 ,  C11D3/33 ,  C11D3/38618 ,  C11D3/38636 ,  C11D3/38663 ,  C11D11/0023

摘要： A dishwasher composition includes at least one strong chelant, at least one weak chelant, a structural constituent, at least one surfactant, and a primary polymer. The primary polymer includes a copolymer having sulfonic acid monomer units and monomer units comprising one or more supplemental monomers, wherein the primary polymer comprises from 10 wt. % to 50 wt. % sulfonic acid monomer units and has a weight average molecular weight of less than or equal to 20,000 g/mol. The dishwasher composition can be a liquid or a gel and has a pH of from 7.0 to 9.5. Methods of washing articles include preparing a wash solution that includes water and the dishwasher composition, and contacting at least one article with the washing solution during at least a portion of a wash cycle of a commercially-available dishwasher.

公开(公告)号：US20180065919A1

公开(公告)日：2018-03-08

申请号：US15554492

申请日：2016-03-01

申请人： BASF SE

发明人： Constanze FRANZKE ,  Frank JAEKEL ,  Carsten SUELING

IPC分类号： C07C227/18 ,  C07C229/16 ,  C11D3/33 ,  C11D3/00

CPC分类号： C07C227/18 ,  C07B2200/07 ,  C07C229/16 ,  C11D3/0047 ,  C11D3/33

摘要： The present invention is directed towards mixtures comprising (A) 90 to 99.9% by weight of a mixture of L- and D-enantiomers of methyl glycine diacetic acid (MGDA) or its respective mono-, di- or trialkali metal or mono-, di- or triammonium salts, said mixture containing predominantly the respective L-enantiomer with an enantiomeric excess (ee) in the range of from 10 to 99%, and (B) in total 0.1 to 10% by weight of the diacetic acid derivative of at least one amino acid selected from valine, leucine, isoleucine, and tyrosine, as free acids or respective mono-, di- or trialkali metal or mono-, di- or triammonium salts, percentages referring to the sum from (A) and (B).

公开(公告)号：US09688946B2

公开(公告)日：2017-06-27

申请号：US14060918

申请日：2013-10-23

申请人： MILLIKEN & COMPANY

发明人： Yogesh Saraf ,  Eduardo Torres ,  Sanjeev K. Dey ,  Paul D. Halphen

IPC分类号： C11D3/00 ,  C11D3/40 ,  C11D11/00

CPC分类号： C11D3/40 ,  C11D1/002 ,  C11D1/008 ,  C11D1/12 ,  C11D1/38 ,  C11D1/94 ,  C11D3/0047 ,  C11D10/04 ,  C11D11/0023

摘要： A cleaning composition comprises at least one surfactant and at least one colorant. The cleaning composition can have a pH of about 3 or less. The colorant exhibits one of several specified structures at a pH of about 7. A method for cleaning a surface utilizes the cleaning composition.

公开(公告)号：US20170022453A1

公开(公告)日：2017-01-26

申请号：US15285314

申请日：2016-10-04

申请人： THE CLOROX COMPANY

发明人： Dewain Garner ,  William L. Smith ,  Jared Heymann

IPC分类号： C11D3/395 ,  A01N47/44 ,  C11D3/00 ,  A01N59/00 ,  C11D3/26 ,  C11D3/10

CPC分类号： C11D3/3951 ,  A01N47/44 ,  A01N59/00 ,  B05C9/06 ,  B65D25/04 ,  B65D25/08 ,  B65D85/70 ,  C11D3/0042 ,  C11D3/0047 ,  C11D3/048 ,  C11D3/10 ,  C11D3/22 ,  C11D3/26 ,  C11D3/3953 ,  C11D3/3955 ,  C11D3/3956 ,  C11D3/3958 ,  C11D7/10 ,  C11D7/105 ,  C11D17/041 ,  A01N25/32

摘要： This invention relates to extend the benefits of using hypochlorite compounds such as sodium hypochlorite to clean and disinfect articles while reducing or eliminating the side effects of treating an article with a strong oxidant material. The invention relates to a single step process involving mixing of precursor compositions of a suitable hypohalite or hypohalous acid with a solution of a reducing agent. Optionally a buffer may be present in either or both precursor compositions, such that at time of use such active hypohalous acid concentration in the resulting aqueous mixture remains at a sufficient activity level to effect one or more desired benefits against a target substrate for a desired period of time. The oxidant is substantially consumed by reaction with the reducing agent after the time needed for achieving the desired benefit has passed.

摘要翻译： 本发明涉及使用次氯酸钠化合物如次氯酸钠来清洁和消毒制品的优点，同时减少或消除用强氧化剂材料处理制品的副作用。 本发明涉及包括将合适的次卤酸盐或次卤酸的前体组合物与还原剂溶液混合的单步方法。 任选地，一种或两种前体组合物中可存在缓冲液，使得在使用时，所得含水混合物中的这种活性次卤酸浓度保持足够的活性水平，以在目标底物上达到所需期望的一种或多种所需益处 的时间。 在达到期望的效益所需的时间已经过去之后，氧化剂通常与还原剂反应消耗。

公开(公告)号：US09512384B2

公开(公告)日：2016-12-06

申请号：US14681784

申请日：2015-04-08

申请人： Ecolab USA Inc.

发明人： Catherine Hanson ,  Andrew Wold ,  Traci Gioino ,  Kim R. Smith ,  Yvonne Marie Killeen

IPC分类号： C11D1/83 ,  C11D1/825 ,  C11D3/00 ,  C11D3/34 ,  B08B1/00 ,  B08B3/02 ,  C11D11/00 ,  C11D1/72 ,  C11D1/722

CPC分类号： C11D1/83 ,  B08B1/001 ,  B08B3/02 ,  C11D1/72 ,  C11D1/722 ,  C11D1/825 ,  C11D3/0026 ,  C11D3/0047 ,  C11D3/3409 ,  C11D11/0023

摘要： Compositions and methods for improved cleaning using neutral cleaners are disclosed. In particular, neutral pH cleaning compositions according to the invention employ a synergistic combination of water insoluble surfactants and an anionic hydrotropes capable of forming a stable, low-foaming solution. The neutral cleaning solutions provide significant benefits over water insoluble microemulsions traditionally used for neutral cleaning compositions and provide at least equivalent cleaning efficacy as non-neutral cleaning compositions.

公开(公告)号：US09493729B2

公开(公告)日：2016-11-15

申请号：US14768712

申请日：2013-09-20

申请人： EQUATOR GLOBAL LIMITED

发明人： Sirilak Narongtanupone ,  Peter Nelson Wainman ,  Areerat Lertamornchaikul

IPC分类号： C11D3/382 ,  C11D3/43 ,  C11D7/44 ,  C11D7/50 ,  C11D3/38 ,  C11D3/00 ,  C11D3/20 ,  C11D3/04 ,  C11D3/22 ,  C11D1/12 ,  C11D1/66 ,  C11D1/90 ,  C11D3/10

CPC分类号： C11D3/38 ,  A23Y2220/00 ,  C11D1/12 ,  C11D1/146 ,  C11D1/662 ,  C11D1/90 ,  C11D3/001 ,  C11D3/0026 ,  C11D3/0047 ,  C11D3/0073 ,  C11D3/0084 ,  C11D3/04 ,  C11D3/042 ,  C11D3/044 ,  C11D3/046 ,  C11D3/10 ,  C11D3/2048 ,  C11D3/2065 ,  C11D3/2079 ,  C11D3/2086 ,  C11D3/2096 ,  C11D3/22 ,  C11D3/221 ,  C11D3/382 ,  C11D3/43 ,  C11D11/0017 ,  C11D11/04 ,  C12P1/04 ,  C12P7/40 ,  C12P7/56

摘要： Described herein are natural cleaning compositions comprising fermented fruit solutions, methods for making the same, and methods for using the same. The fermented fruit solutions can contain fruit, sugar and water. Further described herein are methods of making fermented fruit solutions for use with cleaning compositions. The fermented fruit solutions described herein can be used in cleaning compositions including laundry detergents, stain removers, fabric softeners, floor cleaners, bathroom cleaners, dishwashing products, kitchen cleaners, liquid soap, multi-purpose cleaners and the like.

摘要翻译： 本文描述了包含发酵水果溶液的天然清洁组合物，其制备方法及其使用方法。 发酵的果汁可以含有水果，糖和水。 本文进一步描述的是制备用于清洁组合物的发酵水果溶液的方法。 本文所述的发酵水果溶液可用于清洁组合物，包括衣物洗涤剂，去污剂，织物柔软剂，地板清洁剂，浴室清洁剂，洗碗产品，厨房清洁剂，液体皂，多用途清洁剂等。

公开(公告)号：US20150197710A1

公开(公告)日：2015-07-16

申请号：US14671144

申请日：2015-03-27

申请人： THE CLOROX COMPANY

发明人： Dewain Garner ,  William L. Smith ,  Jared Heymann

IPC分类号： C11D3/395 ,  C11D3/00

CPC分类号： C11D3/3951 ,  A01N47/44 ,  A01N59/00 ,  B05C9/06 ,  B65D25/04 ,  B65D25/08 ,  B65D85/70 ,  C11D3/0042 ,  C11D3/0047 ,  C11D3/048 ,  C11D3/10 ,  C11D3/22 ,  C11D3/26 ,  C11D3/3953 ,  C11D3/3955 ,  C11D3/3956 ,  C11D3/3958 ,  C11D7/10 ,  C11D7/105 ,  C11D17/041 ,  A01N25/32

摘要： This invention relates to extend the benefits of using hypochlorite compounds such as sodium hypochlorite to clean and disinfect articles while reducing or eliminating the side effects of treating an article with a strong oxidant material. The invention relates to a single step process involving mixing of precursor compositions of a suitable hypohalite or hypohalous acid with a solution of a reducing agent. Optionally a buffer may be present in either or both precursor compositions, such that at time of use such active hypohalous acid concentration in the resulting aqueous mixture remains at a sufficient activity level to effect one or more desired benefits against a target substrate for a desired period of time. The oxidant is substantially consumed by reaction with the reducing agent after the time needed for achieving the desired benefit has passed.

摘要翻译： 本发明涉及使用次氯酸钠化合物如次氯酸钠来清洁和消毒制品的优点，同时减少或消除用强氧化剂材料处理制品的副作用。 本发明涉及包括将合适的次卤酸盐或次卤酸的前体组合物与还原剂溶液混合的单步方法。 任选地，一种或两种前体组合物中可存在缓冲液，使得在使用时，所得含水混合物中的这种活性次卤酸浓度保持足够的活性水平，以在目标底物上达到所需期望的一种或多种所需益处 的时间。 在达到期望的效益所需的时间已经过去之后，氧化剂通常与还原剂反应消耗。