公开(公告)号：US20230068139A1

公开(公告)日：2023-03-02

申请号：US17459827

申请日：2021-08-27

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Wei CHOU ,  Yuan-Hsin CHI ,  Yin-Tun CHOU ,  Hung-Chih WANG ,  Yu-Chi LIU ,  Chih-Ming WANG

IPC: H01L21/687 ,  H01L21/285 ,  H01L21/768

Abstract: A clamp ring including an inner periphery of increased diameter at locations where inwardly extending tabs are not located reduces the risk a workpiece that is placed in close proximity to the clamp ring or which contacts the clamp ring during processing will stick to the clamp ring.

公开(公告)号：US20240387233A1

公开(公告)日：2024-11-21

申请号：US18786382

申请日：2024-07-26

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Wei CHOU ,  Yuan-Hsin CHI ,  Yin-Tun CHOU ,  Hung-Chih WANG ,  Yu-Chi LIU ,  Chih-Ming WANG

IPC: H01L21/687 ,  H01L21/285 ,  H01L21/768

Abstract: A clamp ring including an inner periphery of increased diameter at locations where inwardly extending tabs are not located reduces the risk a workpiece that is placed in close proximity to the clamp ring or which contacts the clamp ring during processing will stick to the clamp ring.

公开(公告)号：US20230373100A1

公开(公告)日：2023-11-23

申请号：US17749051

申请日：2022-05-19

Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.

Inventor： Chih-Wei CHOU ,  Sheng-Yuan LIN ,  Yuan-Hsin CHI ,  Hung-Chih WANG ,  Yu-Chi LIU

IPC: B25J15/00 ,  B25J11/00

CPC classification number: B25J15/0014 ,  B25J11/0095

Abstract: The present disclosure is directed to a transfer blade including a first end segment, a second end segment opposite to the first end segment, and an intermediate segment extending from the first end segment to the second end segment. The first end segment includes a first contact region and the second end segment includes a second contact region. The first and second contact regions are configured to contact locations of a surface of a workpiece that do not overlap or are not aligned with a sensitive area of the workpiece. The sensitive area of the workpiece may be an EUV frame or a reticle of the workpiece. A non-contact region extends continuously along the first end segment, the intermediate segment, and the second end segment, and the non-contact region overlaps the sensitive area of the workpiece and is spaced apart from the sensitive area of the workpiece.