公开(公告)号：US20010021477A1

公开(公告)日：2001-09-13

申请号：US09772485

申请日：2001-01-29

Applicant: U.S. PHILIPS CORPORATION

Inventor： Peter Dirksen ,  Casparus Anthonius Henricus Juffermans

IPC: G03F009/00 ,  G03C005/00

CPC classification number: G03F1/26 ,  G03F1/32 ,  G03F1/36

Abstract: A method is described for imaging, by means of projection radiation, a phaseshifting mask pattern on a substrate for the purpose of configuring device features in the substrate. By using a mask pattern comprising mask features constituted by a phase transition (22) and two sub-resolution assist features (40,41), arranged symmetrically with respect to the phase transition and having a mutual distance (p), device features having a wide variety of widths can be obtained by varying only the mutual distance.

Abstract translation: 描述了一种用于通过投影辐射将衬底上的移相掩模图案成像以用于配置衬底中的器件特征的方法。 通过使用包括由相变（22）构成的掩模特征的掩模图案和相对于相变对称地具有相互距离（p）的两个子分辨率辅助特征（40,41），装置特征具有 可以通过仅改变相互距离来获得各种各样的宽度。