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    Magnetic etching process, especially for magnetic or magnetooptic recording
    1.
    发明申请
    Magnetic etching process, especially for magnetic or magnetooptic recording 有权
    磁性蚀刻工艺，特别适用于磁性或磁光记录

    公开(公告)号：US20040259036A1

    公开(公告)日：2004-12-23

    申请号：US10825454

    申请日：2004-04-14

    发明人： Claude Chappert ,  Harry Bernas ,  Jacques Ferre

    IPC分类号： G03C005/00 ,  A61N005/00 ,  G21G005/00

    CPC分类号： G11B5/855 ,  B82Y10/00 ,  B82Y20/00 ,  B82Y25/00 ,  B82Y40/00 ,  G02B6/1225 ,  G02F1/09 ,  G11B5/743 ,  G11B5/746 ,  G11B11/10582 ,  H01F10/123 ,  H01F10/3286 ,  H01F41/303 ,  H01F41/34

    摘要： Process for writing on a material, in which said material is irradiated by means of a beam of light ions, such as for example Henull ions, said beam of light ions having an energy of the order of or less than a hundred keV, wherein this material comprises a plurality of superposed thin-layers, at least one of said thin layers being magnetic and in that one or more regions having sizes of the order of 1 micrometer or less are irradiated, the irradiation dose being controlled so as to be a few 1016 ions/cm2 or less, the irradiation modifying the composition of atomic planes in the material at one or more interfaces between two layers of the latter.

    摘要翻译： 在材料上书写的方法，其中所述材料通过光离子束例如He +离子照射，所述光束离子具有等于或小于百keV的能量 其中，所述材料包括多个重叠的薄层，所述薄层中的至少一个是磁性的，并且照射一个或多个尺寸为1微米或更小的尺寸的一个或多个区域，照射剂量被控制为 为几十个离子/ cm 2以下，照射改变材料中原子平面的组成在两层之间的一个或多个界面处。

    Exposure apparatus and device fabrication method
    2.
    发明申请
    Exposure apparatus and device fabrication method 有权
    曝光装置和装置制造方法

    公开(公告)号：US20040256574A1

    公开(公告)日：2004-12-23

    申请号：US10871210

    申请日：2004-06-18

    发明人： Hisashi Namba

    IPC分类号： G03C005/00

    CPC分类号： G03F7/70875

    摘要： In order to improve a responsiveness of the radiation cooling and to switch a cooling position, an exposure apparatus for exposing an object includes a cooling mechanism for radiation-cooling the object, and a regulator for regulating a radiant heat transfer amount between said cooling mechanism and the object.

    摘要翻译： 为了提高辐射冷却的响应性和切换冷却位置，用于使物体曝光的曝光装置包括用于对物体进行辐射冷却的冷却机构，以及用于调节所述冷却机构与所述散热装置之间的辐射传热量的调节器， 物体。

    Method of forming fine pattern
    4.
    发明申请
    Method of forming fine pattern 审中-公开
    形成精细图案的方法

    公开(公告)号：US20040248042A1

    公开(公告)日：2004-12-09

    申请号：US10491619

    申请日：2004-04-02

    发明人： Minoru Toriumi ,  Tamio Yamazaki ,  Hiroyuki Watanabe ,  Toshiro Itani ,  Takayuki Araki ,  Meiten Koh ,  Takuji Ishikawa

    IPC分类号： G03C005/00

    CPC分类号： G03F7/0395 ,  G03F7/0046 ,  G03F7/0392

    摘要： There is provided a method of forming, on a substrate, a fine resist pattern comprising a step for forming a photosensitive layer by using a photo-sensitive composition comprising at least a compound generating an acid by irradiation of light and a fluorine-containing polymer, in which the fluorine-containing polymer is represented by the formula (1): -(M1)-(M2)-(A1)- nullnull(1) wherein the structural unit M1 is a structural unit derived from a fluorine-containing monomer, in which at least one fluorine atom is bonded to any of carbon atoms forming the polymer trunk chain, the structural unit M2 is a structural unit having an aliphatic ring structure in the polymer trunk chain, the structural unit A1 is a structural unit derived from a monomer copolymerizable with the monomers to introduce the structural units M1 and M2, provided that at least any one of the structural units M1, M2 and A1 has an acid-reactive functional group Y, and contents of the structural units M1, M2 and A1 are from 1 to 99% by mole, from 1 to 99% by mole and from 0 to 98% by mole, respectively, and the polymer satisfies Equation (X): NT/(NCnullNOnull4NF2)null2.0, wherein NT is a compositional average number of whole atoms constituting the fluorine-containing polymer, NC is a compositional average number of carbon atoms, NO is a compositional average number of oxygen atoms and NF is a compositional average number of fluorine atoms bonded to carbon atoms of the polymer trunk chain and bonded to carbon atoms forming an aliphatic ring structure among fluorine atoms which constitute the fluorine-containing polymer. In the method of forming a fine pattern, the photosensitive composition having high practicality and prepared using a material having high transparency against exposure light having a short wavelength such as F2 laser beam is used as a resist.

    摘要翻译： 提供了一种在基板上形成精细抗蚀剂图案的方法，该抗蚀剂图案包括通过使用至少包含通过照射光产生酸的化合物和含氟聚合物的光敏组合物形成感光层的步骤， 其中含氟聚合物由式（1）表示： - （M1） - （M2） - （A1） - （1）其中结构单元M1是衍生自含氟单体的结构单元， 其中至少一个氟原子与形成聚合物主链的任何碳原子键合，结构单元M2是在聚合物主链中具有脂族环结构的结构单元，结构单元A1是衍生自单体的结构单元 与单体共聚以引入结构单元M1和M2，条件是结构单元M1，M2和A1中的至少任一个具有酸反应性官能团Y，并且结构单元M1，M2和A1的含量来自 1到 99摩尔％，1〜99摩尔％，0〜98摩尔％，聚合物满足式（X）：NT /（NC-NO + 4NF 2）≤2.0，式中，NT 是构成含氟聚合物的全部原子的组成平均数，NC是组成平均碳原子数，NO是氧原子的组成平均数，NF是与碳原子键合的氟原子的组成平均数 聚合物主链，并与构成含氟聚合物的氟原子之间形成脂族环结构的碳原子结合。 在形成精细图案的方法中，作为抗蚀剂，使用具有高实用性的光敏组合物，并且使用具有高透明度的材料，具有短波长的曝光光如F2激光束。

    Reduction of imaging artifacts in a platesetter having a diffractive modulator
    5.
    发明申请
    Reduction of imaging artifacts in a platesetter having a diffractive modulator 失效
    具有衍射调制器的制版机中的成像伪像的减少

    公开(公告)号：US20040248021A1

    公开(公告)日：2004-12-09

    申请号：US10845042

    申请日：2004-05-13

    发明人： John F. Nolan

    IPC分类号： G03C005/00 ,  G03F007/00 ,  G03F007/26

    CPC分类号： H04N1/40037 ,  G02B26/0808 ,  G03F7/2057 ,  H04N1/4005 ,  Y10S430/146

    摘要： A platesetter may have an optical imaging head which includes a diffractive modulator having individually controlled ribbons associated with individual pixels imaged onto a printing plate. One method for reducing artifacts transferred to a medium includes the steps of: determining values of intensity versus pulse width variations for each ribbon of the modulator based upon empirical data; weighting the determined values according to a predetermined weighting factor dependent upon physical, optical, chemical and structural characteristics of a printing plate to yield an image on the printing plate having minimum visible artifacts; and applying the weighted values to ribbon drivers of the modulator.

    摘要翻译： 制版机可以具有光学成像头，该成像头包括衍射调制器，该衍射调制器具有与映射到印刷版上的各个像素相关联的单独控制的色带。 用于减少传送到介质的伪像的一种方法包括以下步骤：基于经验数据确定调制器的每个带的强度对脉冲宽度变化的值; 根据取决于印版的物理，光学，化学和结构特性的预定加权因子对确定的值进行加权，以产生具有最小可见伪影的印刷版上的图像; 并将加权值应用于调制器的色带驱动器。

    Phase shift mask and method of fabricating the same
    6.
    发明申请
    Phase shift mask and method of fabricating the same 失效
    相移掩模及其制造方法

    公开(公告)号：US20040248018A1

    公开(公告)日：2004-12-09

    申请号：US10859551

    申请日：2004-06-03

    发明人： Myung-Ah Kang ,  In-Kyun Shin

    IPC分类号： G03C005/00 ,  G03F009/00

    CPC分类号： G03F1/34 ,  G03F1/30

    摘要： A phase shift mask includes a first non-phase shift region, a first phase shift region adjacent the first non-phase shift region, a second non-phase shift region, a second phase shift region adjacent the second non-phase shift region, and an opaque region interposed between said second phase shift and non-phase shift regions. The first and second non-phase shift regions transmit an exposure light at its original phase, whereas the first and second phase shift regions invert the phase of the exposure light. The phase shift mask is manufactured by first forming a layer of opaque material on a transparent mask substrate. The first phase shift region and the second phase and non-phase shift regions are formed by selectively etching the opaque material and underlying portions of the mask substrate to form recesses in the substrate. On the other hand, only the opaque layer is etched from the mask substrate to form the first non-phase shift region, and is left on the substrate between the second phase shift and non-phase shift regions.

    摘要翻译： 相移掩模包括第一非相移区域，与第一非相移区域相邻的第一相移区域，第二非相移区域，与第二非相移区域相邻的第二相移区域，以及 位于所述第二相移和非相移区域之间的不透明区域。 第一和第二非相移区域以其初始相位发射曝光光，而第一和第二相移区域反转曝光光的相位。 通过在透明掩模基板上首先形成不透明材料层来制造相移掩模。 通过选择性地蚀刻不透明材料和掩模基板的下面部分形成第一相移区域和第二相位和非相移区域，以在衬底中形成凹陷。 另一方面，从掩模基板仅蚀刻不透明层以形成第一非相移区域，并且留在第二相移与非相移区域之间的衬底上。

    Fabrication of photosensitive couplers
    7.
    发明申请
    Fabrication of photosensitive couplers 审中-公开
    感光耦合器的制造

    公开(公告)号：US20040244425A1

    公开(公告)日：2004-12-09

    申请号：US10456505

    申请日：2003-06-09

    发明人： Xiaolin Tong ,  Anthony S. Kewitsch ,  George A. Rakuljic

    IPC分类号： G11B007/24 ,  G03C005/00 ,  G01N023/00 ,  C03B037/022

    CPC分类号： G02B6/2835 ,  G02B6/02114

    摘要： Systems devices and methods in accordance with the invention impart high strength index of refraction patterns to photosensitive optical devices, such as Bragg gratings written in optical fibers. A length of small diameter fiber retaining photosensitivity is fabricated by flame elongation of an optical fiber precursor having dopant containing cladding, using a diffuse, low velocity inverted flame that does not introduce water, OH or H2 into the fiber. By varying the flame velocity during each scan the fiber is diminished to a small, uniform diameter, waist region. Photosensitivity is preserved and enhanced by exposure of the prepared waist region to scanning actinic illumination within an in-diffusing environment of pressurizing hydrogen or deuterium, and controlling the exposure to optimize the photo-induced index change.

    摘要翻译： 根据本发明的系统装置和方法赋予光学光学装置（例如用光纤写入的布拉格光栅）的高强度折射率图。 通过使用不向水中引入水，OH或H 2的漫反射低速倒置火焰，通过具有含有掺杂剂的掺杂剂的光纤前体的火焰伸长来制造长度小的纤维保持光敏性。 通过在每次扫描期间改变火焰速度，纤维减小到一个小的，均匀的直径腰部区域。 通过将制备的腰围暴露于在加压氢或氘的扩散扩散环境内扫描光化照明并且控制曝光以优化光致指数变化来保持和增强光敏性。

    Method of dividing a non-metal substrate
    8.
    发明申请
    Method of dividing a non-metal substrate 有权
    分割非金属基板的方法

    公开(公告)号：US20040241962A1

    公开(公告)日：2004-12-02

    申请号：US10849796

    申请日：2004-05-21

    发明人： Yusuke Nagai

    IPC分类号： G03C005/00 ,  H01L021/301 ,  H01L021/46

    CPC分类号： H01L21/67092 ,  B23K26/0853 ,  B23K26/40 ,  B23K26/53 ,  B23K26/57 ,  B23K2101/40 ,  B23K2103/50 ,  H01L21/78

    摘要： A method of dividing a non-metal substrate having a first surface and a second surface formed parallel to the first surface, comprising: a deteriorated layer forming step for forming a deteriorated layer in the inside of the non-metal substrate along dividing lines by applying a laser beam capable of passing through the non-metal substrate from the first surface side with its converging point on the inside thereof; and a deteriorated layer exposing step for exposing the deteriorated layer to the first surface by grinding the first surface side of the non-metal substrate having the deteriorated layer formed therein.

    摘要翻译： 一种分割具有与第一表面平行形成的第一表面和第二表面的非金属基板的方法，包括：劣化层形成步骤，用于通过施加沿分割线在非金属基板的内侧形成劣化层 激光束，其能够从第一表面侧穿过非金属基板，其内部具有会聚点; 以及劣化层曝光步骤，用于通过研磨其中形成有劣化层的非金属基板的第一表面侧将劣化层暴露于第一表面。

    Photomask pattern
    9.
    发明申请
    Photomask pattern 有权
    光掩模图案

    公开(公告)号：US20040229131A1

    公开(公告)日：2004-11-18

    申请号：US10457978

    申请日：2003-06-09

    发明人： Chin-Lung Lin ,  Chuen-Huei Yang ,  Wen-Tien Hung

    IPC分类号： G03F009/00 ,  G03C005/00

    CPC分类号： G03F1/36 ,  G03F1/26

    摘要： A photomask pattern on a substrate is provided. The photomask pattern comprises a main pattern and a sub-resolution assistant feature. The sub-resolution assistant feature is located on the sides of the main pattern. Furthermore, the sub-resolution assistant feature comprises a first assistant feature and a second assistant feature. The first assistant feature is formed close to the main pattern and the second assistant feature is formed further away from the main pattern but adjacent to the first assistant feature. There is a phase difference of 180null between the first assistant feature and the main pattern. Similarly, there is a phase difference of 180null between the second assistant feature and the first assistant feature. Since the main pattern is bordered by reverse-phase assistant feature, exposure resolution of the photomask is increased.

    摘要翻译： 提供了基板上的光掩模图案。 光掩模图案包括主图案和子分辨率辅助特征。 子分辨率辅助功能位于主图案的两侧。 此外，子分辨率辅助特征包括第一辅助特征和第二辅助特征。 第一辅助功能形成在主模式附近，第二辅助功能远离主模式形成，但与第一辅助功能相邻。 第一辅助特征与主图案之间存在180°的相位差。 类似地，在第二辅助特征和第一辅助特征之间存在180°的相位差。 由于主图案由反相辅助功能界定，因此增加了光掩模的曝光分辨率。