公开(公告)号：US20180355474A1

公开(公告)日：2018-12-13

申请号：US15757820

申请日：2017-02-27

Applicant: ULVAC, Inc.

Inventor： Yousuke Kobayashi ,  Harunori Iwai ,  Tetsushi Fujinaga ,  Atsuhito Ihori ,  Noriaki Tani

IPC: C23C14/35 ,  C23C14/06 ,  H01J37/34 ,  H01F41/18

CPC classification number: C23C14/35 ,  C23C14/06 ,  C23C14/34 ,  H01F41/18 ,  H01J37/3405 ,  H01J37/3426 ,  H01J37/3452

Abstract: A film formation apparatus includes a target containing a magnetic material, a support that supports a substrate and locates the substrate in an arrangement region opposing the target, and a magnetic field formation unit located at a side of the arrangement region opposite to the target. The magnetic field formation unit forms a horizontal magnetic field parallel to an oscillation direction, which is one direction extending along the substrate, at a side of the arrangement region where the target is located. The magnetic field formation unit oscillates the horizontal magnetic field in the oscillation direction at least between one end of the arrangement region and another end of the arrangement region in the oscillation direction.

公开(公告)号：US11111577B2

公开(公告)日：2021-09-07

申请号：US15757820

申请日：2017-02-27

Applicant: ULVAC, Inc.

Inventor： Yousuke Kobayashi ,  Harunori Iwai ,  Tetsushi Fujinaga ,  Atsuhito Ihori ,  Noriaki Tani

IPC: C23C14/35 ,  H01F41/18 ,  C23C14/34 ,  H01J37/34 ,  C23C14/06

Abstract: A film formation apparatus includes a target containing a magnetic material, a support that supports a substrate and locates the substrate in an arrangement region opposing the target, and a magnetic field formation unit located at a side of the arrangement region opposite to the target. The magnetic field formation unit forms a horizontal magnetic field parallel to an oscillation direction, which is one direction extending along the substrate, at a side of the arrangement region where the target is located. The magnetic field formation unit oscillates the horizontal magnetic field in the oscillation direction at least between one end of the arrangement region and another end of the arrangement region in the oscillation direction.