公开(公告)号：US20220384139A1

公开(公告)日：2022-12-01

申请号：US17369077

申请日：2021-07-07

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Zheng-Yang LI ,  Chian-Chen KUO ,  Yi-Cheng LU ,  Ji-Fu KUNG

IPC: H01J37/08 ,  H01L21/67 ,  H01J37/305 ,  H01J27/18

Abstract: An automatic adjustment method and an automatic adjustment device of a beam of a semiconductor apparatus, and a training method of a parameter adjustment model are provided. The automatic adjustment method of the beam of the semiconductor apparatus includes the following steps. The semiconductor apparatus generates the beam. A wave curve of the beam is obtained. The wave curve is segmented into several sections. The slope of each of the sections is obtained. Several environmental factors of the semiconductor apparatus are obtained. According to the slopes and the environmental factors, at least one parameter adjustment command of the semiconductor apparatus is analyzed through the parameter adjustment model.