公开(公告)号：US10762618B1

公开(公告)日：2020-09-01

申请号：US16275480

申请日：2019-02-14

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Pin-Yen Tsai ,  Hsu-Tang Liu ,  Yi-Jung Chang ,  Chun-Liang Hou

IPC: G06K9/00 ,  G06T7/00

Abstract: A mask weak pattern recognition apparatus and a mask weak pattern recognition method are provided. The mask weak pattern recognition apparatus includes a receiving unit, an overlapping unit, an analyzing unit and a training unit. The receiving unit is used for receiving a mask layout and an inspection image of a mask. The overlapping unit is used for overlapping the mask layout and the inspection image to obtain an overlapped image. The analyzing unit is used for obtaining a plurality of risk patterns and a plurality of risk scores each of which corresponds one of the risk patterns according to the overlapped image. The training unit is used for training a recognition model according to the risk patterns and the risk scores.