公开(公告)号：US20230195989A1

公开(公告)日：2023-06-22

申请号：US17574527

申请日：2022-01-12

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Pin-Yen Tsai ,  Yi-Jung Chang

IPC: G06F30/392 ,  G06N20/10

CPC classification number: G06F30/392 ,  G06N20/10

Abstract: The invention provides an operation method of a semiconductor system, which includes providing a system which includes a layout pattern to scanning electron microscope (SEM) pattern prediction model (LS model) and a novelty detection model (ND model), inputting a layout pattern to the ND model, and the ND model judges whether the layout pattern is a novel layout pattern, and if the layout pattern is confirmed as the novel layout pattern after judgment, performing a process step on the novel layout pattern to form an SEM (scanning electron microscope) pattern.

公开(公告)号：US12032891B2

公开(公告)日：2024-07-09

申请号：US17574527

申请日：2022-01-12

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Pin-Yen Tsai ,  Yi-Jung Chang

IPC: G06F30/392 ,  G06N20/10

CPC classification number: G06F30/392 ,  G06N20/10

Abstract: The invention provides an operation method of a semiconductor system, which includes providing a system which includes a layout pattern to scanning electron microscope (SEM) pattern prediction model (LS model) and a novelty detection model (ND model), inputting a layout pattern to the ND model, and the ND model judges whether the layout pattern is a novel layout pattern, and if the layout pattern is confirmed as the novel layout pattern after judgment, performing a process step on the novel layout pattern to form an SEM (scanning electron microscope) pattern.

公开(公告)号：US10762618B1

公开(公告)日：2020-09-01

申请号：US16275480

申请日：2019-02-14

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Pin-Yen Tsai ,  Hsu-Tang Liu ,  Yi-Jung Chang ,  Chun-Liang Hou

IPC: G06K9/00 ,  G06T7/00

Abstract: A mask weak pattern recognition apparatus and a mask weak pattern recognition method are provided. The mask weak pattern recognition apparatus includes a receiving unit, an overlapping unit, an analyzing unit and a training unit. The receiving unit is used for receiving a mask layout and an inspection image of a mask. The overlapping unit is used for overlapping the mask layout and the inspection image to obtain an overlapped image. The analyzing unit is used for obtaining a plurality of risk patterns and a plurality of risk scores each of which corresponds one of the risk patterns according to the overlapped image. The training unit is used for training a recognition model according to the risk patterns and the risk scores.