公开(公告)号：US20140331191A1

公开(公告)日：2014-11-06

申请号：US13887377

申请日：2013-05-06

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Tsung-Yeh Wu ,  Chin-Lung Lin ,  Yao-Jen Fan ,  Wei-Han Chien ,  Chia-Chun Tsai

IPC: G06F17/50

CPC classification number: G06F17/5081 ,  G03F1/36

Abstract: A method of correcting assist features includes the following steps. At first, a first layout pattern is received by a computer system, and the first layout pattern is split into a plurality of first regions. Subsequently, a plurality of assist features are added into the first layout pattern to form a second layout pattern, wherein at least one of the assist features neighboring any one of the edges of the first regions is defined as a selected pattern. Then, the second layout pattern is split into a plurality of second regions. Afterwards, a check step is performed on the second region including the selected pattern, and the second layout pattern is corrected to form a corrected second layout pattern.

Abstract translation: 一种校正辅助功能的方法包括以下步骤。 首先，由计算机系统接收第一布局图案，并且将第一布局图案分割成多个第一区域。 随后，将多个辅助特征添加到第一布局图案中以形成第二布局图案，其中与第一区域的任何边缘相邻的辅助特征中的至少一个被定义为所选择的图案。 然后，第二布局图案被分割成多个第二区域。 然后，对包括所选择的图案的第二区域执行检查步骤，并校正第二布局图案以形成校正的第二布局图案。

公开(公告)号：US09009633B2

公开(公告)日：2015-04-14

申请号：US13887377

申请日：2013-05-06

Applicant: United Microelectronics Corp.

Inventor： Tsung-Yeh Wu ,  Chin-Lung Lin ,  Yao-Jen Fan ,  Wei-Han Chien ,  Chia-Chun Tsai

IPC: G06F17/50 ,  G03F1/00

CPC classification number: G06F17/5081 ,  G03F1/36

Abstract: A method of correcting assist features includes the following steps. At first, a first layout pattern is received by a computer system, and the first layout pattern is split into a plurality of first regions. Subsequently, a plurality of assist features are added into the first layout pattern to form a second layout pattern, wherein at least one of the assist features neighboring any one of the edges of the first regions is defined as a selected pattern. Then, the second layout pattern is split into a plurality of second regions. Afterwards, a check step is performed on the second region including the selected pattern, and the second layout pattern is corrected to form a corrected second layout pattern.

Abstract translation: 一种校正辅助功能的方法包括以下步骤。 首先，由计算机系统接收第一布局图案，并且将第一布局图案分割成多个第一区域。 随后，将多个辅助特征添加到第一布局图案中以形成第二布局图案，其中与第一区域的任何边缘相邻的辅助特征中的至少一个被定义为所选择的图案。 然后，第二布局图案被分割成多个第二区域。 然后，对包括所选择的图案的第二区域执行检查步骤，并校正第二布局图案以形成校正的第二布局图案。