公开(公告)号：US20090114157A1

公开(公告)日：2009-05-07

申请号：US12331264

申请日：2008-12-09

申请人： WEI TI LEE ,  STEVE H. CHIAO

发明人： WEI TI LEE ,  STEVE H. CHIAO

IPC分类号： C23C16/44

CPC分类号： C23C16/4482 ,  Y10S261/65

摘要： Embodiments of the invention provide an apparatus for generating a precursor gas used in a vapor deposition process system. The apparatus contains a canister or an ampoule for containing a chemical precursor and a splash guard contained within the ampoule. The splash guard is positioned to obstruct the chemical precursor in a liquid state from being bumped or splashed into a gas outlet during the introduction of a carrier gas into the ampoule. The carrier gas is usually directed into the ampoule through a gas inlet and combines with the vaporized chemical precursor to form a precursor gas. The splash guard is also positioned to permit the passage of the precursor gas from the gas outlet. In one example, the gas outlet contains a stem with a tapered tip and the splash guard is positioned at an angle parallel to the plane of the tapered tip.

摘要翻译： 本发明的实施例提供一种用于产生在气相沉积工艺系统中使用的前体气体的装置。 该装置包含用于容纳安瓿内的化学前体和防溅罩的罐或安瓿。 飞溅防护罩的定位是在将载气引入安瓿中时，阻止液态的化学前体被撞击或溅入气体出口。 载气通常通过气体入口引导到安瓿中，并与蒸发的化学前体结合以形成前体气体。 防溅罩也被定位成允许来自气体出口的前体气体通过。 在一个示例中，气体出口包含具有锥形尖端的杆，并且防溅罩以与锥形尖端的平面平行的角度定位。