公开(公告)号：US20140071422A1

公开(公告)日：2014-03-13

申请号：US14009289

申请日：2012-03-23

申请人： Yu Zhu ,  Yaying Chen ,  Ming Zhang ,  Dengfeng Xu ,  Jinsong Wang

发明人： Yu Zhu ,  Yaying Chen ,  Ming Zhang ,  Dengfeng Xu ,  Jinsong Wang

IPC分类号： G03F7/20

CPC分类号： G03F7/70725 ,  G03F7/70733

摘要： Disclosed is a dual wafer stage switching system for a lithography machine. The system comprises a base stage (30), a wafer stage (16.1) running at a pre-processing workstation, and a wafer stage (16.2) running at an exposure workstation. A rotating motor (41) is mounted under the base stage (30) for rotating the two wafer stages after the wafer stages have completed pre-processing and exposure operations in order to complete position switch of the wafer stages, wherein the base stage (30) is kept stationary during the switch. The present invention avoids rotation of a large inertia base stage and has low requirement for motor power, while eliminating a guide rail docking device and an auxiliary device and greatly simplifying system configuration. The system is easy and convenient to operate and easy to control.

摘要翻译： 公开了一种用于光刻机的双晶片级切换系统。 该系统包括基台（30），在预处理工作站处运行的晶片台（16.1）和在曝光工作站运行的晶片台（16.2）。 旋转马达（41）安装在底座（30）的下面，用于在晶片台完成预处理和曝光操作之后旋转两个晶片台，以便完成晶片台的位置切换，其中基台 ）在开关期间保持静止。 本发明避免了大惯性基台的旋转，并且对电机功率的要求较低，同时消除了导轨对接装置和辅助装置，并大大简化了系统配置。 该系统操作简便，易于控制。

公开(公告)号：US09547245B2

公开(公告)日：2017-01-17

申请号：US14009289

申请日：2012-03-23

申请人： Yu Zhu ,  Yaying Chen ,  Ming Zhang ,  Dengfeng Xu ,  Jinsong Wang

发明人： Yu Zhu ,  Yaying Chen ,  Ming Zhang ,  Dengfeng Xu ,  Jinsong Wang

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70725 ,  G03F7/70733

摘要： Disclosed is a dual wafer stage switching system for a lithography machine. The system comprises a base stage (30), a wafer stage (16.1) running at a pre-processing workstation, and a wafer stage (16.2) running at an exposure workstation. A rotating motor (41) is mounted under the base stage (30) for rotating the two wafer stages after the wafer stages have completed pre-processing and exposure operations in order to complete position switch of the wafer stages, wherein the base stage (30) is kept stationary during the switch. The present invention avoids rotation of a large inertia base stage and has low requirement for motor power, while eliminating a guide rail docking device and an auxiliary device and greatly simplifying system configuration. The system is easy and convenient to operate and easy to control.

摘要翻译： 公开了一种用于光刻机的双晶片级切换系统。 该系统包括基台（30），在预处理工作站处运行的晶片台（16.1）和在曝光工作站运行的晶片台（16.2）。 旋转马达（41）安装在底座（30）的下面，用于在晶片台完成预处理和曝光操作之后旋转两个晶片台，以便完成晶片台的位置切换，其中基台 ）在开关期间保持静止。 本发明避免了大惯性基台的旋转，并且对电机功率的要求较低，同时消除了导轨对接装置和辅助装置，并大大简化了系统配置。 该系统操作简便，易于控制。