公开(公告)号：US07312915B2

公开(公告)日：2007-12-25

申请号：US11135230

申请日：2005-05-23

Applicant: Satyadev Patel ,  Jianglong Zhang

Inventor： Satyadev Patel ,  Jianglong Zhang

IPC: G02B26/00 ,  G02B26/08

CPC classification number: G02B26/0841

Abstract: A microelectromechanical device having a movable element with low mass inertia is disclosed herein. The movable element is held on a substrate such that the element is capable of rotating relative to the substrate; and the element has a mass inertia of 1.2×10−24 kg·m2 or less.

Abstract translation: 本文公开了具有低质量惯性的可移动元件的微机电装置。 可移动元件被保持在基板上，使得元件能够相对于基板旋转; 并且所述元件的质量惯量为1.2×10 -2 -24m 2 /小于或等于2。

公开(公告)号：US07215458B2

公开(公告)日：2007-05-08

申请号：US10982259

申请日：2004-11-05

Applicant: Peter Richards ,  Satyadev Patel ,  Andrew G. Huibers ,  Michel Combes

Inventor： Peter Richards ,  Satyadev Patel ,  Andrew G. Huibers ,  Michel Combes

IPC: G02B26/00

CPC classification number: G09G3/346 ,  G09G2320/04

Abstract: A method and apparatus for operating spatial light modulator have been disclosed herein. The spatial light modulator comprises an array of micromirror devices, each of which further comprises a reflective deflectable mirror plate attached to a deformable hinge, and an addressing electrode for addressing and deflecting the mirror plate.

Abstract translation: 本文已经公开了用于操作空间光调制器的方法和装置。 空间光调制器包括微镜器件的阵列，每个微镜器件还包括连接到可变形铰链的反射偏转镜板，以及用于寻址和偏转镜板的寻址电极。

公开(公告)号：US20060262382A1

公开(公告)日：2006-11-23

申请号：US11135230

申请日：2005-05-23

Applicant: Satyadev Patel ,  Jianglong Zhang

Inventor： Satyadev Patel ,  Jianglong Zhang

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: A microelectromechanical device having a movable element with low mass inertia is disclosed herein. The movable element is held on a substrate such that the element is capable of rotating relative to the substrate; and the element has a mass inertia of 1.2×10−24 kg.m2 or less.

Abstract translation: 本文公开了具有低质量惯性的可移动元件的微机电装置。 可移动元件被保持在基板上，使得元件能够相对于基板旋转; 并且所述元件的质量惯量为1.2×10 -2 -24m 2 /小于或等于2。

公开(公告)号：US20060227406A1

公开(公告)日：2006-10-12

申请号：US11102531

申请日：2005-04-08

Applicant: Satyadev Patel ,  Peter Heureux ,  Jonathan Doan ,  Regis Grasser

Inventor： Satyadev Patel ,  Peter Heureux ,  Jonathan Doan ,  Regis Grasser

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: Disclosed herein is method of operating a device that comprises an array of micromirrors. The method comprises a process usable for repairing stuck micromirrors of the micromirror array during the operation. The reparation process applies, at the ON state, two consecutive refresh voltages to the mirror plates of the micromirrors in the array with the pulses being separated in time longer than the characteristic oscillation time of the micromirrors. The reparation process can be applied independently to the micromirrors. Alternatively, the reparation process can be incorporated with a bias inversion process.

Abstract translation: 这里公开了一种操作包括微镜阵列的装置的方法。 该方法包括可用于在操作期间修复微镜阵列的粘性微镜的过程。 修复过程在ON状态下，对阵列中的微镜的镜板施加两个连续的刷新电压，其中脉冲在时间上比微镜的特征振荡时间长。 修复过程可独立应用于微镜。 或者，修复过程可以结合偏置反转过程。

公开(公告)号：US07110160B2

公开(公告)日：2006-09-19

申请号：US11102082

申请日：2005-04-08

Applicant: Satyadev Patel ,  Peter Richards ,  Jonathan Doan ,  Terry Tarn

Inventor： Satyadev Patel ,  Peter Richards ,  Jonathan Doan ,  Terry Tarn

IPC: G02B26/00 ,  G02B26/08

CPC classification number: G02B26/0841 ,  B81C3/001 ,  Y10S359/90 ,  Y10T156/10

Abstract: Disclosed herein a microelectromechanical device having first and second substrates that are bonded together with a gap formed therebetween. A plurality of functional members is disposed within the gap. The two substrates are bonded with a bonding agent that comprises an electrically conductive adhesive material.

Abstract translation: 本文公开了一种具有第一和第二基板的微机电装置，其间形成有间隙结合在一起。 多个功能构件设置在间隙内。 两个基板与包含导电粘合剂材料的粘结剂粘合。

公开(公告)号：US20060193029A1

公开(公告)日：2006-08-31

申请号：US11069408

申请日：2005-02-28

Applicant: Satyadev Patel ,  James Dunphy ,  Peter Richards ,  Michel Combes

Inventor： Satyadev Patel ,  James Dunphy ,  Peter Richards ,  Michel Combes

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: Disclosed herein is method of operating a device that comprises an array of micromirrors. The method comprises a process usable for repairing stuck micromirrors of the micromirror array during the operation. The reparation process applies, at the ON state, two consecutive refresh voltages to the mirror plates of the micromirrors in the array with the pulses being separated in time longer than the characteristic oscillation time of the micromirrors. The reparation process can be applied independently to the micromirrors. Alternatively, the reparation process can be incorporated with a bias inversion process.

公开(公告)号：US20050250362A1

公开(公告)日：2005-11-10

申请号：US11181079

申请日：2005-07-13

Applicant: Jonathan Doan ,  Satyadev Patel ,  Robert Duboc

Inventor： Jonathan Doan ,  Satyadev Patel ,  Robert Duboc

IPC: G02B26/08 ,  H01R13/15

CPC classification number: G02B26/0841 ,  G02B26/0833 ,  Y10T29/49155

Abstract: A micromirror device and a method of making the same are disclosed herein. The micromirror device comprises a mirror plate, hinge, and post each having an electrically conductive layer. One of the hinge, mirror plate, and post further comprises an electrically insulating layer. To enable the electrical connections between the conducting layers of the hinge, mirror plate, and post, the insulating layer is patterned.

Abstract translation: 本文公开了一种微镜器件及其制造方法。 微镜装置包括各自具有导电层的镜板，铰链和柱。 铰链，镜板和柱中的一个还包括电绝缘层。 为了实现铰链，镜板和柱的导电层之间的电连接，绝缘层被图案化。

公开(公告)号：US20100302618A1

公开(公告)日：2010-12-02

申请号：US12853411

申请日：2010-08-10

Applicant: Satyadev Patel ,  Andrew G. Huibers ,  Peter Richards ,  Terry Tarn ,  Dietrich Dehlinger

Inventor： Satyadev Patel ,  Andrew G. Huibers ,  Peter Richards ,  Terry Tarn ,  Dietrich Dehlinger

IPC: G02B26/00 ,  B32B37/14 ,  B05D5/06

CPC classification number: G02B26/0841 ,  B81C3/001 ,  Y10S359/90 ,  Y10T156/10

Abstract: The present invention provides a microstructure device comprising multiple substrates with the components of the device formed on the substrates. In order to maintain uniformity of the gap between the substrates, a plurality of pillars is provided and distributed in the gap so as to prevent decrease of the gap size. The increase of the gap size can be prevented by bonding the pillars to the components of the microstructure. Alternatively, the increase of the gap size can be prevented by maintaining the pressure inside the gap below the pressure under which the microstructure will be in operation. Electrical contact of the substrates on which the micromirrors and electrodes are formed can be made through many ways, such as electrical contact areas, electrical contact pads and electrical contact springs.

Abstract translation: 本发明提供了一种微结构器件，其包括多个衬底，其中器件的部件形成在衬底上。 为了保持基板之间的间隙的均匀性，提供并分布在间隙中的多个支柱以防止间隙尺寸的减小。 可以通过将支柱结合到微结构的部件来防止间隙尺寸的增加。 或者，可以通过将间隙内的压力维持在微结构将在其中操作的压力以下来防止间隙尺寸的增加。 形成微反射镜和电极的基板的电接触可以通过许多方式制成，例如电接触区域，电接触焊盘和电接触弹簧。

公开(公告)号：US07375873B2

公开(公告)日：2008-05-20

申请号：US11069408

申请日：2005-02-28

Applicant: Satyadev Patel ,  James Dunphy ,  Peter Richards ,  Michel Combes

Inventor： Satyadev Patel ,  James Dunphy ,  Peter Richards ,  Michel Combes

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: Disclosed herein is method of operating a device that comprises an array of micromirrors. The method comprises a process usable for repairing stuck micromirrors of the micromirror array during the operation. The reparation process applies, at the ON state, two consecutive refresh voltages to the mirror plates of the micromirrors in the array with the pulses being separated in time longer than the characteristic oscillation time of the micromirrors. The reparation process can be applied independently to the micromirrors. Alternatively, the reparation process can be incorporated with a bias inversion process.

Abstract translation: 这里公开的是操作包括微镜阵列的装置的方法。 该方法包括可用于在操作期间修复微镜阵列的粘性微镜的过程。 修复过程在ON状态下，对阵列中的微镜的镜板施加两个连续的刷新电压，其中脉冲在时间上比微镜的特征振荡时间长。 修复过程可独立应用于微镜。 或者，修复过程可以结合偏置反转过程。

公开(公告)号：US07153443B2

公开(公告)日：2006-12-26

申请号：US10805610

申请日：2004-03-18

Applicant: Jonathan Doan ,  Satyadev Patel

Inventor： Jonathan Doan ,  Satyadev Patel

IPC: H01L21/302

CPC classification number: B81C1/00793 ,  B81B2201/042 ,  B81C2201/053

Abstract: A microstructure and the method for making the same are disclosed herein. The microstructure has structural members, at least one of which comprises an intermetallic compound. In making such a microstructure, a sacrificial material is employed. After completion of forming the structural layers, the sacrificial material is removed by a spontaneous vapor phase chemical etchant.

Abstract translation: 本文公开了微结构及其制造方法。 微结构具有结构构件，其中至少一个包括金属间化合物。 在制造这样的微结构时，采用牺牲材料。 在完成形成结构层之后，牺牲材料通过自发气相化学腐蚀剂除去。