DETECTION TARGET POSITIONING DEVICE, DETECTION TARGET POSITIONING METHOD, AND SIGHT TRACKING DEVICE

    公开(公告)号:US20190147605A1

    公开(公告)日:2019-05-16

    申请号:US16182950

    申请日:2018-11-07

    Abstract: Disclosed is a detection target positioning method and device. The method comprises: acquiring an original image and pre-processing the original image to obtain a gradation of each pixel in a target gradation image corresponding to a target region including a detection target; calculating first gradation sets corresponding to rows of pixels of the target gradation image and second gradation sets corresponding to columns of pixels of the target gradation image; and determining rows of two ends of the detection target in a column direction according to the first gradation sets, determining columns of two ends of the detection target in a row direction according to the second gradation sets, and determining a center of the detection target according to the row of two ends of the detection target in the column direction and the columns of two ends of the detection target in the row direction.

    MASK AND METHOD OF FABRICATING SPACERS
    94.
    发明申请
    MASK AND METHOD OF FABRICATING SPACERS 有权
    掩模和方法制作间隔

    公开(公告)号:US20150316797A1

    公开(公告)日:2015-11-05

    申请号:US14416430

    申请日:2014-05-26

    Abstract: A mask and a method of fabricating spacers (2) using the mask (1). The mask (1) comprises a light transmitting region including an array of light transmitting holes (230), a light non-transmitting region and a phase shifting layer (240) formed in one of two adjacent light transmitting holes (230) of the mask for shifting phrase of lights passing through the light transmitting holes (230). Thus, a light intensity can be reduced or lowered to zero when the lights pass through a diffractive region of the two adjacent light transmitting holes (230). Therefore, a bridging effect between two adjacent spacers (2) is alleviated and even avoided during fabricating the spacers (2).

    Abstract translation: 掩模和使用掩模(1)制造间隔物(2)的方法。 掩模(1)包括透光区域,该透光区域包括形成在掩模的两个相邻透光孔(230)之一中的光透射孔(230)阵列,光非透射区域和相移层(240) 用于移动通过透光孔(230)的光的短语。 因此,当光通过两个相邻的透光孔(230)的衍射区域时,光强度可以降低或降低到零。 因此,在制造间隔物(2)期间,减轻了两个相邻间隔物(2)之间的桥接效应,甚至避免了桥接效应。

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