公开(公告)号：US06577442B2

公开(公告)日：2003-06-10

申请号：US09965170

申请日：2001-09-27

申请人： Michael Goldstein

发明人： Michael Goldstein

IPC分类号： F21V906

CPC分类号： G03F7/70575 ,  G03F7/70158 ,  G03F7/70191 ,  G03F7/702

摘要： In one embodiment of the invention, a grating structure etched on a mirror substrate has a grating period causing diffracting, out of an optical path, a first incident radiation within a first band around a first wavelength. A multi-layer coating deposited on the grating structure reflects the first incident radiation, in the optical path, within the first band and a second incident radiation within a second band around a second wavelength. In another embodiment, a first multi-layer coating deposited on a mirror substrate reflects a first incident radiation within a first band around a first wavelength and a second incident radiation, in an optical path, within a second band around a second wavelength. A grating structure is deposited on the first multi-layer coating. The grating structure is etched to have a grating period causing diffracting, out of the optical path, the second incident radiation within the second band.

公开(公告)号：US06435479B1

公开(公告)日：2002-08-20

申请号：US10015317

申请日：2001-12-12

申请人： Dan Raz ,  Michael Goldstein

发明人： Dan Raz ,  Michael Goldstein

IPC分类号： B66D100

CPC分类号： B62D43/045 ,  B66D1/54

摘要： The invention provides a device for securing the upper terminal position of a liftable and lowerable object, comprising cable means having a hoist-side end and an object-side end; a stationary bracket having an aperture disposed in a substantially horizontal plane; a housing supported by the object-side end of the cable means and carrying the object, the housing having a lower portion and an upper portion, at least the upper portion being configured to pass through the aperture, a first opening at the top of the upper portion and a second opening at the bottom of the lower portion facilitating the passage of the cable means through the housing, and two oppositely located, elongated slots extending along at least parts of the upper portion; lever means located inside, and extending through a substantial portion of, the housing, the lever means being pivotably mounted in the lower portion of the housing and being provided with catch means and camming means, the lever means having a first limit position in which the camming means protrudes through one of the elongated slots, and a second limit position in which said catch means protrudes through the other one of the elongated slots, and spring means adapted to act on the lever means and biasing the lever means towards the second limit position.

摘要翻译： 本发明提供一种用于固定可抬起和可降低物体的上端子位置的装置，包括具有起重机侧端部和物体侧端部的电缆装置; 固定支架，其具有设置在基本上水平的平面中的孔; 由所述电缆装置的物体侧端部支撑并承载所述物体的壳体，所述壳体具有下部和上部，所述至少所述上部构造成穿过所述孔，所述第一开口位于所述顶部的顶部 上部部分和第二开口处于下部部分的底部，便于电缆装置通过壳体，以及沿着上部的至少一部分延伸的两个相对定位的细长狭槽; 杠杆装置位于壳体的内部并且延伸穿过壳体的主要部分，杠杆装置可枢转地安装在壳体的下部中并且设置有捕捉装置和凸轮装置，杠杆装置具有第一极限位置， 凸轮装置突出穿过其中一个细长的槽，以及第二极限位置，其中所述的捕捉装置突出穿过另一个细长的槽，以及适于作用在杠杆装置上的弹簧装置，并且朝着第二极限位置偏置杠杆装置 。

公开(公告)号：US6031932A

公开(公告)日：2000-02-29

申请号：US829993

申请日：1997-04-02

申请人： Rafail Bronstein ,  Omer Karp ,  Michael Goldstein

发明人： Rafail Bronstein ,  Omer Karp ,  Michael Goldstein

IPC分类号： B41F33/00 ,  G06K9/00

CPC分类号： B41F33/0036 ,  B41F33/0027 ,  B41N3/003

摘要： A method for inspecting a surface of a printing medium, the method comprising the steps of acquiring an image of the surface or a portion thereof, digitizing the acquired image whereby a digitized real representation of the surface or portion is obtained. The method also include the step of for each of said digitized real representation performing either or both of the steps of comparing said digitized real representation with a digital reference representation, said reference representation being a virtual digital fault-free representation of said surface or portion thereof and determining whether said real digitized representation is in compliance with stipulations of a set of rules which define the characteristics of a fault-free digital representation of said surface or portion, and providing either a correct indication output signal where there is a match between said real digitized representation with said reference digital representation in the case of the step of comparing or compliance with said rules in the case of said step of determining, or fault indication output signal where there is a mismatch in the case of the step of comparing or incompliance in the case of the case of determining.

摘要翻译： 一种用于检查打印介质的表面的方法，所述方法包括以下步骤：获取所述表面或其一部分的图像，数字化所获取的图像，由此获得所述表面或部分的数字化的实际表示。 该方法还包括对于每个所述数字化的实际表示的步骤，执行将所述数字化实际表示与数字参考表示进行比较的步骤之一或两者，所述参考表示是所述表面或其部分的虚拟数字无故障表示 以及确定所述真实数字化表示是否符合限定所述表面或部分的无故障数字表示的特性的一组规则的规定，以及提供正确的指示输出信号，其中在所述真实数字化表示之间存在匹配 在所述确定步骤的情况下比较或符合所述规则的步骤的情况下具有所述参考数字表示的数字化表示，或者在步骤比较或不符合的情况下存在不匹配的故障指示输出信号 情况确定的情况。

公开(公告)号：US5494439A

公开(公告)日：1996-02-27

申请号：US217363

申请日：1994-03-24

申请人： Michael Goldstein ,  Cari H. Shim

发明人： Michael Goldstein ,  Cari H. Shim

IPC分类号： C04B41/45 ,  C04B41/50 ,  C04B41/81 ,  C04B41/85 ,  C23C16/44 ,  C23C16/458 ,  C30B35/00 ,  C03C15/00

CPC分类号： C23C16/4404 ,  C04B41/459 ,  C04B41/5096 ,  C04B41/81 ,  C04B41/85 ,  C23C16/4581 ,  C30B35/00 ,  Y10T29/41

摘要： A silicon/silicon carbide material which eliminates contamination by outgassing and direct contact is described as well as wafer processing pans made of this material and wafer processing methods using the silicon/silicon carbide material. An ultraclean silicon/silicon carbide material may be formed by first forming a Si/SiC part by prior art methods. The Si/SiC part then is subjected to a temperature sufficient to cause the impurities within the silicon carbide to either react and/or diffuse into the silicon fill. The contaminated silicon fill is then removed, either by high temperature evaporation or by a chemical etch. Clean silicon is then impregnated within the pore space of the silicon carbide pan. The part which results has ultraclean silicon and silicon carbide grains which have most, if not all, of the impurities removed from the surface of the grains. Thus, an ultraclean material results which will not outgas or directly contaminate silicon wafers.

摘要翻译： 描述消除由除气和直接接触引起的污染物的硅/碳化硅材料以及由该材料制成的晶片加工盘和使用硅/碳化硅材料的晶片加工方法。 可以通过首先通过现有技术的方法形成Si / SiC部分来形成超硬硅/碳化硅材料。 然后，Si / SiC部分经受足以使碳化硅内的杂质反应和/或扩散到硅填料中的温度。 然后通过高温蒸发或通过化学蚀刻除去污染的硅填充物。 然后将清洁的硅浸渍在碳化硅盘的孔隙空间内。 结果的部分具有从谷粒表面去除的最多（如果不是全部）杂质的超纯硅和碳化硅颗粒。 因此，产生不会排出或直接污染硅晶片的超纯材料。