公开(公告)号：US20100110605A1

公开(公告)日：2010-05-06

申请号：US12580029

申请日：2009-10-15

Applicant: Weonmook LEE ,  Hwankook CHAE ,  Kunjoo PARK ,  Sungyong KO ,  Minshik KIM ,  Keehyun KIM

Inventor： Weonmook LEE ,  Hwankook CHAE ,  Kunjoo PARK ,  Sungyong KO ,  Minshik KIM ,  Keehyun KIM

IPC: H01L21/683

CPC classification number: H01L21/6833 ,  H01J37/32623 ,  H01J37/32642

Abstract: Provided is an electrostatic chuck assembly for a plasma reactor. The assembly includes an electrostatic chuck, an electrostatic chuck cover ring, and a cathode assembly cover ring. The electrostatic chuck includes a body part and a protrusion part. The body part has a disk shape of a first diameter. The protrusion part is formed integrally with the body part and protrudes from the body part, and has a disk shape of a second diameter less than the first diameter. The electrostatic chuck cover ring is disposed to surround an outer circumference of the protrusion part. The cathode assembly cover ring is disposed at an upper part of the cathode assembly to surround an outer circumference of the electrostatic chuck cover ring and an outer circumference of the body part.

Abstract translation: 提供了一种用于等离子体反应器的静电卡盘组件。 组件包括静电卡盘，静电卡盘盖环和阴极组件盖环。 静电卡盘包括主体部分和突出部分。 主体部分具有第一直径的盘形。 突起部与主体部一体地形成，并且从主体部突出，并且具有比第一直径小的第二直径的盘状。 静电吸盘盖环设置成围绕突出部的外周。 阴极组件盖环设置在阴极组件的上部，以围绕静电卡盘盖环的外周和主体部分的外周。

公开(公告)号：US20090280040A1

公开(公告)日：2009-11-12

申请号：US12416658

申请日：2009-04-01

Applicant: Kunjoo PARK ,  Hwankook CHAE ,  Sungyong KO ,  Keehyun KIM ,  Weonmook LEE

Inventor： Kunjoo PARK ,  Hwankook CHAE ,  Sungyong KO ,  Keehyun KIM ,  Weonmook LEE

IPC: B01J19/08 ,  H01L21/306

CPC classification number: H01J37/32633 ,  H01J37/32623

Abstract: A plasma chemical reactor is provided. The reactor includes a chamber, a cathode assembly, and a baffle plate. The chamber forms a plasma reaction space. The cathode assembly includes a cathode support shaft and a substrate support. The cathode support shaft is coupled at one side to a wall surface of the chamber. The substrate support is coupled to the other side of the cathode support shaft and supports the substrate. The baffle plate is out inserted and coupled to the substrate support, and has a plurality of vents arranged to be spaced apart and through formed such that reaction gas can pass through, and the vents asymmetrically arranged and formed to get a vent area smaller at an opposite side than a top side of the cathode support shaft.

Abstract translation: 提供等离子体化学反应器。 反应器包括室，阴极组件和挡板。 室形成等离子体反应空间。 阴极组件包括阴极支撑轴和衬底支撑件。 阴极支撑轴在一侧连接到腔室的壁表面。 衬底支撑件耦合到阴极支撑轴的另一侧并支撑衬底。 挡板被插入并联接到基板支撑件，并且具有多个通风口，其布置成间隔开并形成为使得反应气体可以通过，并且通风口不对称地布置和形成，以使排气面积在 与阴极支撑轴的顶侧相对。