公开(公告)号：US07276717B2

公开(公告)日：2007-10-02

申请号：US11267561

申请日：2005-11-04

Applicant: Osamu Kakuchi ,  Yoshiyuki Kuramoto

Inventor： Osamu Kakuchi ,  Yoshiyuki Kuramoto

IPC: G03B27/42 ,  G01B11/02

CPC classification number: G03F7/706 ,  G03F7/70341

Abstract: A measuring apparatus for measuring optical performance of a target optical system to be measured includes an optical unit for splitting light from a light source into measuring light and reference light so that the measuring light can be introduced into the target optical system, a reflection unit for reflecting the measuring light from the target optical system toward the target optical system via a fluid, and a detector for detecting an interference fringe generated between interference between the measuring light that has emitted from the target optical system after being reflected by the reflection unit and the reference light that does not pass the target optical system.

Abstract translation: 用于测量待测光学系统的光学性能的测量装置包括：用于将来自光源的光分解为测量光和参考光的光学单元，使得测量光可以被引入到目标光学系统中;反射单元，用于 将来自目标光学系统的测量光经由流体反射到目标光学系统;以及检测器，用于检测在由反射单元反射之后从目标光学系统发射的测量光之间产生的干涉条纹和 不通过目标光学系统的参考光。

公开(公告)号：US07236254B2

公开(公告)日：2007-06-26

申请号：US11335473

申请日：2006-01-20

Applicant: Osamu Kakuchi ,  Eiichi Murakami

Inventor： Osamu Kakuchi ,  Eiichi Murakami

IPC: G01B11/02

CPC classification number: G03F7/706 ,  G01B9/02098

Abstract: A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source and passing through the illumination system, a projection optical system for projecting a pattern, as illuminated with the light, onto a second object for exposure of the same with the pattern, and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.

Abstract translation: 投影曝光装置包括曝光光源，用于照射形成在第一物体上的图案的照明系统，其具有来自曝光光源的光并通过照明系统，用于投影图案的投影光学系统，如 将光照射到与图案相同的第二物体上，以及用于测量投影光学系统的光学特性的干涉仪，其中干涉仪可操作以通过使用来自曝光光的光进行测量 资源。

公开(公告)号：US20060227334A1

公开(公告)日：2006-10-12

申请号：US11448868

申请日：2006-06-08

Applicant: Osamu Kakuchi

Inventor： Osamu Kakuchi

IPC: G01B11/02

CPC classification number: G01M11/0264 ,  G01M11/0271 ,  G03F7/706

Abstract: A method disclosed in this specification is an aberration measuring method in which a light flux converged by a condensing optical system is made incident on a optical system to be measured, the light flux that has passed through the optical system to be measured is reflected by a reflecting optical system having a center of curvature at a light convergence point on a light emergence side of the optical system to be measured is made incident on the optical system to be measure again, and wavefront aberration of the optical system to be measured is detected as interference fringes using the light flux that has passed through the optical system to be measured again. Measurement is carried out while changing the numerical aperture of the optical system to be measured to a numerical aperture larger than a numerical aperture in the actual use, thereby realizing highly precise measurement of the wavefront aberration all over the effective numerical aperture of the optical system to be measured.

公开(公告)号：US07095509B2

公开(公告)日：2006-08-22

申请号：US10791081

申请日：2004-03-01

Applicant: Osamu Kakuchi

Inventor： Osamu Kakuchi

IPC: G01B9/02

CPC classification number: G01M11/0264 ,  G01M11/0271 ,  G03F7/706

Abstract: A method disclosed in this specification is an aberration measuring method in which a light flux converged by a condensing optical system is made incident on a optical system to be measured, the light flux that has passed through the optical system to be measured is reflected by a reflecting optical system having a center of curvature at a light convergence point on a light emergence side of the optical system to be measured is made incident on the optical system to be measure again, and wavefront aberration of the optical system to be measured is detected as interference fringes using the light flux that has passed through the optical system to be measured again. Measurement is carried out while changing the numerical aperture of the optical system to be measured to a numerical aperture larger than a numerical aperture in the actual use, thereby realizing highly precise measurement of the wavefront aberration all over the effective numerical aperture of the optical system to be measured.

Abstract translation: 本说明书中公开的方法是通过会聚光学系统会聚的光束入射到待测光学系统上的像差测量方法，通过待测光学系统的光束被反射 在要测量的光学系统的光出射侧的光会聚点处具有曲率中心的反射光学系统入射到要再次测量的光学系统上，并且将被测量的光学系统的波前像差检测为 使用已经通过要被测量的光学系统的光通量的干涉条纹。 在实际使用中，将要测量的光学系统的数值孔径改变为大于数值孔径的数值孔径进行测量，从而实现在光学系统的有效数值孔径上的波前像差的高精度测量 被测量。

公开(公告)号：US20050099635A1

公开(公告)日：2005-05-12

申请号：US10620389

申请日：2003-07-17

Applicant: Osamu Kakuchi ,  Eiichi Murakami

Inventor： Osamu Kakuchi ,  Eiichi Murakami

IPC: H01L21/027 ,  G01B9/02 ,  G03F7/20

CPC classification number: G03F7/706 ,  G01B9/02098

Abstract: A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source, a projection optical system for projecting a pattern, as illuminated with the light, onto a second object and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.

Abstract translation: 投影曝光装置包括：曝光光源，用于照射形成在第一物体上的图案的照明系统，其具有来自曝光光源的光;投影光学系统，用于将由光照射的图案投影到第二 物体和用于测量投影光学系统的光学特性的干涉仪，其中干涉仪可操作以通过使用来自曝光光源的光来进行测量。

公开(公告)号：US06614535B1

公开(公告)日：2003-09-02

申请号：US09533376

申请日：2000-03-22

Applicant: Osamu Kakuchi ,  Eiichi Murakami

Inventor： Osamu Kakuchi ,  Eiichi Murakami

IPC: G01B902

CPC classification number: G03F7/706 ,  G01B9/02098

Abstract: A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source and passing through the illumination system, a projection optical system for projecting the pattern, as illuminated with the light, onto a second object for exposure of the same with the pattern and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.

Abstract translation: 投影曝光装置包括曝光光源，用于照射形成在第一物体上的图案的照明系统，其具有来自曝光光源的光并通过照明系统，用于投影图案的投影光学系统，如 将光照射到用于与图案一起曝光的第二物体和用于测量投影光学系统的光学特性的干涉仪，其中干涉仪可操作以通过使用来自曝光光源的光进行测量 。

公开(公告)号：US07995213B2

公开(公告)日：2011-08-09

申请号：US12830213

申请日：2010-07-02

Applicant: Osamu Kakuchi ,  Yoshiyuki Kuramoto

Inventor： Osamu Kakuchi ,  Yoshiyuki Kuramoto

IPC: G01B9/02

CPC classification number: G03F7/706 ,  G03F7/70566

Abstract: A measurement method of measuring a wavefront aberration of an optical system to be measured, comprising a first measurement step of measuring wavefronts of the optical system to be measured with respect to linearly polarized light beams along at least three different azimuths, a first calculation step of calculating a wavefront of the optical system to be measured with respect to non-polarized light and a birefringent characteristic of the optical system to be measured, based on the wavefronts of the optical system to be measured, which are measured in the first measurement step, and a second calculation step of calculating a wavefront of the optical system to be measured with respect to arbitrary polarized light, based on the wavefront and the birefringent characteristic of the optical system to be measured, which are calculated in the first calculation step.

Abstract translation: 一种测量被测光学系统的波前像差的测量方法，包括：测量相对于沿着至少三个不同方位角的线偏振光束的待测光学系统的波前的第一测量步骤;第一计算步骤， 基于在第一测量步骤中测量的待测量的光学系统的波前，计算相对于非偏振光测量的光学系统的波前和待测量的光学系统的双折射特性， 以及第二计算步骤，基于在第一计算步骤中计算出的要测量的光学系统的波前和双折射特性来计算相对于任意偏振光测量的光学系统的波前。

公开(公告)号：US20090219494A1

公开(公告)日：2009-09-03

申请号：US12392746

申请日：2009-02-25

Applicant: Osamu Kakuchi

Inventor： Osamu Kakuchi

IPC: G03B27/00 ,  G01B11/03 ,  G01B9/02 ,  G06F15/00

CPC classification number: G01M11/0271 ,  G01J2009/0234 ,  G03B27/00 ,  G03F7/706

Abstract: An evaluation method of evaluating an optical characteristic of an optical system to be evaluated using an interferometer, comprises a first acquisition step of acquiring a first interference fringe formed by the interferometer when a location of a movable element of the interferometer in an optical axis direction of the optical system is a first location, a second acquisition step of acquiring a second interference fringe formed by the interferometer when the location of the movable element in the optical axis direction is a second location different from the first location, a determination step of determining a pupil-center coordinate of the optical system based on the acquired first interference fringe and the acquired second interference fringe, and a computation step of computing the optical characteristic of the optical system using the pupil-center coordinate determined in the determination step.

Abstract translation: 使用干涉仪评价光学系统的光学特性的评价方法包括：第一获取步骤，当干涉仪的可动元件的位置在光轴方向上时，获取由干涉仪形成的第一干涉条纹 光学系统是第一位置，第二采集步骤，当可移动元件在光轴方向上的位置是不同于第一位置的第二位置时，获取由干涉仪形成的第二干涉条纹;确定步骤，确定 基于获取的第一干涉条纹和获取的第二干涉条纹，光学系统的瞳孔中心坐标，以及计算步骤，使用在确定步骤中确定的瞳孔中心坐标来计算光学系统的光学特性。

公开(公告)号：US20060097205A1

公开(公告)日：2006-05-11

申请号：US11267561

申请日：2005-11-04

Applicant: Osamu Kakuchi ,  Yoshiyuki Kuramoto

Inventor： Osamu Kakuchi ,  Yoshiyuki Kuramoto

IPC: G01N21/86

CPC classification number: G03F7/706 ,  G03F7/70341

Abstract: A measuring apparatus for measuring optical performance of a target optical system to be measured includes an optical unit for splitting light from a light source into measuring light and reference light so that the measuring light can be introduced into the target optical system, a reflection unit for reflecting the measuring light from the target optical system toward the target optical system via a fluid, and a detector for detecting an interference fringe generated between interference between the measuring light that has emitted from the target optical system after being reflected by the reflection unit and the reference light that does not pass the target optical system.

Abstract translation: 用于测量待测光学系统的光学性能的测量装置包括：用于将来自光源的光分解为测量光和参考光的光学单元，使得测量光可以被引入到目标光学系统中;反射单元，用于 将来自目标光学系统的测量光经由流体反射到目标光学系统;以及检测器，用于检测在由反射单元反射之后从目标光学系统发射的测量光之间产生的干涉条纹和 不通过目标光学系统的参考光。

公开(公告)号：US5087121A

公开(公告)日：1992-02-11

申请号：US593253

申请日：1990-10-01

Applicant: Osamu Kakuchi ,  Mikichi Ban

Inventor： Osamu Kakuchi ,  Mikichi Ban

IPC: G01B11/06 ,  G01B11/22

CPC classification number: G01B11/22 ,  G01B11/0608

Abstract: A device for measuring depth of a groove formed on an article includes a light source for illuminating the article, a first detector for receiving light from a portion of the article having a groove and being illuminated by the light source, and for detecting a spectral reflectance in relation to the received light, a second detector for receiving light from the article illuminated by the light source and for detecting a spectral reflectance in relation to the received light, the second detector being effective to detect the spectral reflectance in a way not affected or substantially not affected by the groove of the article as compared with the detection by the first detector, and a depth detector for detecting the depth of the groove on the basis of the results of detection by the first and second detectors.

Abstract translation: 用于测量形成在物品上的凹槽的深度的装置包括用于照亮物品的光源，用于接收来自具有凹槽并由光源照射的物品的一部分的光的第一检测器，并用于检测光谱反射率 相对于所接收的光，第二检测器用于接收由光源照射的物品的光并且用于检测相对于接收的光的光谱反射率，第二检测器有效地以不受影响的方式检测光谱反射率， 与第一检测器的检测相比基本上不受制品的凹槽的影响;以及深度检测器，用于基于第一和第二检测器的检测结果来检测凹槽的深度。