公开(公告)号：US07023561B2

公开(公告)日：2006-04-04

申请号：US10620389

申请日：2003-07-17

Applicant: Osamu Kakuchi ,  Eiichi Murakami

Inventor： Osamu Kakuchi ,  Eiichi Murakami

IPC: G01B9/02

CPC classification number: G03F7/706 ,  G01B9/02098

Abstract: A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source, a projection optical system for projecting a pattern, as illuminated with the light, onto a second object, and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.

Abstract translation: 投影曝光装置包括：曝光光源，用于照射形成在第一物体上的图案的照明系统，其具有来自曝光光源的光;投影光学系统，用于将由光照射的图案投影到第二 物体和用于测量投影光学系统的光学特性的干涉仪，其中干涉仪可操作以通过使用来自曝光光源的光来进行测量。

公开(公告)号：US06924881B2

公开(公告)日：2005-08-02

申请号：US10642699

申请日：2003-08-19

Applicant: Eiichi Murakami ,  Osamu Kakuchi

Inventor： Eiichi Murakami ,  Osamu Kakuchi

IPC: H01L21/027 ,  G01M11/02 ,  G03B27/42 ,  G03F7/20 ,  G03B27/54 ,  G03B27/68

CPC classification number: G01M11/0264 ,  G01M11/0271 ,  G03B27/42 ,  G03F7/70058 ,  G03F7/706

Abstract: A projection exposure apparatus includes an illumination optical system for illuminating a pattern formed on a first object, with light, a projection optical system for projecting the pattern of the first object, illuminated by the illumination optical system, onto a second object for exposure of the same with the pattern, a main system including the illumination optical system and the projection optical system, and an interferometer for use in measurement of an optical characteristic of the projection optical system and being mounted on the main system.

Abstract translation: 投影曝光装置包括用于照亮形成在第一物体上的图案的照明光学系统，具有用于将由照明光学系统照明的第一物体的图案投射到第二物体上的投影光学系统，用于曝光 与图案相同，包括照明光学系统和投影光学系统的主系统，以及用于测量投影光学系统的光学特性并安装在主系统上的干涉仪。

公开(公告)号：US07907263B2

公开(公告)日：2011-03-15

申请号：US12493229

申请日：2009-06-28

Applicant: Michiko Aizawa ,  Eiji Aoki ,  Osamu Kakuchi ,  Yoshiyuki Kuramoto

Inventor： Michiko Aizawa ,  Eiji Aoki ,  Osamu Kakuchi ,  Yoshiyuki Kuramoto

IPC: G01B9/00 ,  G01B9/02 ,  G01B11/02

CPC classification number: G03F7/7085 ,  G03F7/705 ,  G03F7/70525 ,  G03F7/706 ,  G03F7/70941

Abstract: The present invention provides a method including measuring a wavefront aberration of the optical system to be measured on a measurement surface, measuring a pupil transmittance distribution of the optical system determining a pupil function of the optical system based on the wavefront aberration and the pupil transmittance distribution, and performing imaging computation using the pupil function to obtain a light intensity distribution formed on an image plane of the optical system, and calculating a flare, generated in the optical system, from the light intensity distribution.

Abstract translation: 本发明提供了一种方法，包括测量测量表面上要测量的光学系统的波前像差，测量基于波前像差和光瞳透射率分布来确定光学系统的光瞳功能的光学系统的光瞳透射率分布 并且使用光瞳函数进行成像计算，以获得形成在光学系统的像面上的光强度分布，以及根据光强度分布计算在光学系统中产生的耀斑。

公开(公告)号：US20100265515A1

公开(公告)日：2010-10-21

申请号：US12830213

申请日：2010-07-02

Applicant: Osamu Kakuchi ,  Yoshiyuki Kuramoto

Inventor： Osamu Kakuchi ,  Yoshiyuki Kuramoto

IPC: G01B9/02

CPC classification number: G03F7/706 ,  G03F7/70566

Abstract: A measurement method of measuring a wavefront aberration of an optical system to be measured, comprising a first measurement step of measuring wavefronts of the optical system to be measured with respect to linearly polarized light beams along at least three different azimuths, a first calculation step of calculating a wavefront of the optical system to be measured with respect to non-polarized light and a birefringent characteristic of the optical system to be measured, based on the wavefronts of the optical system to be measured, which are measured in the first measurement step, and a second calculation step of calculating a wavefront of the optical system to be measured with respect to arbitrary polarized light, based on the wavefront and the birefringent characteristic of the optical system to be measured, which are calculated in the first calculation step.

Abstract translation: 一种测量被测光学系统的波前像差的测量方法，包括：测量相对于沿着至少三个不同方位角的线偏振光束的待测光学系统的波前的第一测量步骤;第一计算步骤， 基于在第一测量步骤中测量的待测量的光学系统的波前，计算相对于非偏振光测量的光学系统的波前和待测量的光学系统的双折射特性， 以及第二计算步骤，基于在第一计算步骤中计算出的要测量的光学系统的波前和双折射特性来计算相对于任意偏振光测量的光学系统的波前。

公开(公告)号：US20100002243A1

公开(公告)日：2010-01-07

申请号：US12493229

申请日：2009-06-28

Applicant: Michiko Aizawa ,  Eiji Aoki ,  Osamu Kakuchi ,  Yoshiyuki Kuramoto

Inventor： Michiko Aizawa ,  Eiji Aoki ,  Osamu Kakuchi ,  Yoshiyuki Kuramoto

IPC: G01B9/02 ,  G01B9/00

CPC classification number: G03F7/7085 ,  G03F7/705 ,  G03F7/70525 ,  G03F7/706 ,  G03F7/70941

Abstract: The present invention provides a method including measuring a wavefront aberration of the optical system to be measured on a measurement surface, measuring a pupil transmittance distribution of the optical system determining a pupil function of the optical system based on the wavefront aberration and the pupil transmittance distribution, and performing imaging computation using the pupil function to obtain a light intensity distribution formed on an image plane of the optical system, and calculating a flare, generated in the optical system, from the light intensity distribution.

Abstract translation: 本发明提供了一种方法，包括测量测量表面上要测量的光学系统的波前像差，测量基于波前像差和光瞳透射率分布来确定光学系统的光瞳功能的光学系统的光瞳透射率分布 并且使用光瞳函数进行成像计算，以获得形成在光学系统的像面上的光强度分布，以及根据光强度分布计算在光学系统中产生的耀斑。

公开(公告)号：US20080273200A1

公开(公告)日：2008-11-06

申请号：US12112125

申请日：2008-04-30

Applicant: Osamu Kakuchi ,  Yoshiyuki Kuramoto

Inventor： Osamu Kakuchi ,  Yoshiyuki Kuramoto

IPC: G01J4/00

CPC classification number: G03F7/706 ,  G03F7/70566

Abstract: A measurement method of measuring a wavefront aberration of an optical system to be measured, comprising a first measurement step of measuring wavefronts of the optical system to be measured with respect to linearly polarized light beams along at least three different azimuths, a first calculation step of calculating a wavefront of the optical system to be measured with respect to non-polarized light and a birefringent characteristic of the optical system to be measured, based on the wavefronts of the optical system to be measured, which are measured in the first measurement step, and a second calculation step of calculating a wavefront of the optical system to be measured with respect to arbitrary polarized light, based on the wavefront and the birefringent characteristic of the optical system to be measured, which are calculated in the first calculation step.

Abstract translation: 一种测量被测光学系统的波前像差的测量方法，包括：测量相对于沿着至少三个不同方位角的线偏振光束的待测光学系统的波前的第一测量步骤;第一计算步骤， 基于在第一测量步骤中测量的待测量的光学系统的波前，计算相对于非偏振光测量的光学系统的波前和待测量的光学系统的双折射特性， 以及第二计算步骤，基于在第一计算步骤中计算出的要测量的光学系统的波前和双折射特性来计算相对于任意偏振光测量的光学系统的波前。

公开(公告)号：US20060114476A1

公开(公告)日：2006-06-01

申请号：US11335473

申请日：2006-01-20

Applicant: Osamu Kakuchi ,  Eiichi Murakami

Inventor： Osamu Kakuchi ,  Eiichi Murakami

IPC: G01B11/02

CPC classification number: G03F7/706 ,  G01B9/02098

Abstract: A projection exposure apparatus includes an exposure light source, an illumination system for illuminating a pattern, formed on a first object, with light from the exposure light source and passing through the illumination system, a projection optical system for projecting a pattern, as illuminated with the light, onto a second object for exposure of the same with the pattern, and an interferometer for use in measurement of an optical characteristic of the projection optical system, wherein the interferometer is operable to perform the measurement by use of light from the exposure light source.

Abstract translation: 投影曝光装置包括曝光光源，用于照射形成在第一物体上的图案的照明系统，其具有来自曝光光源的光并通过照明系统，用于投影图案的投影光学系统，如 将光照射到与图案相同的第二物体上，以及用于测量投影光学系统的光学特性的干涉仪，其中干涉仪可操作以通过使用来自曝光光的光进行测量 资源。

公开(公告)号：US06633362B2

公开(公告)日：2003-10-14

申请号：US09533377

申请日：2000-03-22

Applicant: Eiichi Murakami ,  Osamu Kakuchi

Inventor： Eiichi Murakami ,  Osamu Kakuchi

IPC: G03B2742

CPC classification number: G01M11/0264 ,  G01M11/0271 ,  G03B27/42 ,  G03F7/70058 ,  G03F7/706

Abstract: A projection exposure apparatus includes an illumination optical system for illuminating a pattern formed on a first object, with light, a projection optical system for projecting the pattern of the first object, illuminated by the illumination optical system, onto a second object for exposure of the same with the pattern, a main system including the illumination optical system and the projection optical system, and an interferometer for use in measurement of an optical characteristic of the projection optical system and being mounted on the main system.

Abstract translation: 投影曝光装置包括用于照亮形成在第一物体上的图案的照明光学系统，具有用于将由照明光学系统照明的第一物体的图案投射到第二物体上的投影光学系统，用于曝光 与图案相同，包括照明光学系统和投影光学系统的主系统，以及用于测量投影光学系统的光学特性并安装在主系统上的干涉仪。

公开(公告)号：US4850709A

公开(公告)日：1989-07-25

申请号：US19665

申请日：1987-02-27

Applicant: Mikichi Ban ,  Osamu Kakuchi ,  Hironori Yamamoto ,  Masaru Ohtsuka ,  Osamu Shiba ,  Kazuhiko Hara

Inventor： Mikichi Ban ,  Osamu Kakuchi ,  Hironori Yamamoto ,  Masaru Ohtsuka ,  Osamu Shiba ,  Kazuhiko Hara

IPC: G01J3/26

CPC classification number: G01J3/26

Abstract: Fabri-Perot spectroscopy method comprises a step of directing a light beam at a first refraction angle to a first Fabri-Perot interference plate and a step of directing a light beam transmitted through the first Fabri-Perot interference plate to a second Fabri-Perot interference plate at a second refraction angle, and Fabri-Perot spectroscopy apparatus comprises Fabri-Perot interference plates, a control device for changing a spacing between the Fabri-Perot interference plates, a first optical device for directing a light beam to the first Fabri-Perot interference plate at a first refraction angle, a second optical device for directing the light beam transmitted through the Fabri-Perot interference plate at a second refraction angle different from the first refraction angle to the second Fabri-Perot interference plate, and a seal for externally sealing the Fabri-Perot interference plates. Gas for protecting the Fabri-Perot interference plates is filled in the sealed space.

Abstract translation: Fabri-Pérot光谱法包括将第一折射角的光束引导到第一Fabri-Pérot干涉板的步骤和将透射通过第一Fabri-Pérot干涉板的光束引导到第二Fabri-Pérot干涉 平板以第二折射角，Fabri-Pérot光谱装置包括Fabri-Pérot干涉板，用于改变Fabri-Pérot干涉板之间的间距的控制装置，用于将光束引导到第一Fabri-Pérot的第一光学装置 在第一折射角处的干涉板，用于将透射通过Fabri-Pérot干涉板的光束以不同于第一折射角的第二折射角引导到第二Fabri-Pérot干涉板的第二光学装置，以及用于外部的密封件 密封Fabri-Pérot干涉板。 用于保护Fabri-Pérot干涉板的气体填充在密封空间中。

公开(公告)号：US07773233B2

公开(公告)日：2010-08-10

申请号：US12112125

申请日：2008-04-30

Applicant: Osamu Kakuchi ,  Yoshiyuki Kuramoto

Inventor： Osamu Kakuchi ,  Yoshiyuki Kuramoto

IPC: G01B9/02

CPC classification number: G03F7/706 ,  G03F7/70566

Abstract: A measurement method of measuring a wavefront aberration of an optical system to be measured, comprising a first measurement step of measuring wavefronts of the optical system to be measured with respect to linearly polarized light beams along at least three different azimuths, a first calculation step of calculating a wavefront of the optical system to be measured with respect to non-polarized light and a birefringent characteristic of the optical system to be measured, based on the wavefronts of the optical system to be measured, which are measured in the first measurement step, and a second calculation step of calculating a wavefront of the optical system to be measured with respect to arbitrary polarized light, based on the wavefront and the birefringent characteristic of the optical system to be measured, which are calculated in the first calculation step.

Abstract translation: 一种测量被测光学系统的波前像差的测量方法，包括：测量相对于沿着至少三个不同方位角的线偏振光束的待测光学系统的波前的第一测量步骤;第一计算步骤， 基于在第一测量步骤中测量的待测量的光学系统的波前，计算相对于非偏振光测量的光学系统的波前和待测量的光学系统的双折射特性， 以及第二计算步骤，基于在第一计算步骤中计算出的要测量的光学系统的波前和双折射特性来计算相对于任意偏振光测量的光学系统的波前。