公开(公告)号：US06726545B2

公开(公告)日：2004-04-27

申请号：US10134821

申请日：2002-04-26

Applicant: Subramanian Balakumar ,  Chen Feng ,  Victor Lim ,  Paul Proctor ,  Mukhopadhyay Madhusudan ,  Chivukula Subrahmanyam ,  Yelehanka Ramachandramurthy Pradeep

Inventor： Subramanian Balakumar ,  Chen Feng ,  Victor Lim ,  Paul Proctor ,  Mukhopadhyay Madhusudan ,  Chivukula Subrahmanyam ,  Yelehanka Ramachandramurthy Pradeep

IPC: B24B100

CPC classification number: B24B37/16 ,  B24B21/10 ,  B24B37/245

Abstract: A linear polishing apparatus for polishing a semiconductor substrate including a novel polishing belt arrangement with at least two polishing belts forming a continuous loop. Each belt having an outside polishing surface and an inside smooth surface. The belts are spaced alongside each other sharing a common axis at each end. The belts are looped around a pair of rollers making up a driver roller at one end and a driven roller at the other end. A platen member interposes each belt and is placed between the pairs of rollers. The platen provides a polishing plane and supporting surface for the polishing belts. The polishing plane includes a plurality of holes communicating with an elongated plenum chamber underlying the plane. The chamber supplies a compressed gas to impart an upward pressure against the polishing belts. The driver rollers are coupled to separate motors to independently drive and control at least said two of the polishing belts.

Abstract translation: 一种用于抛光包括具有形成连续环的至少两个抛光带的新型抛光带装置的半导体衬底的线性抛光装置。 每个带具有外部抛光表面和内部光滑表面。 皮带沿着彼此间隔开，在每一端共享公共轴线。 皮带环绕一对辊组成一端的驱动辊和另一端的从动辊。 压板构件插入每个带并且放置在成对的辊之间。 压板提供抛光平面和抛光带的支撑表面。 抛光平面包括与平面下方的细长的增压室连通的多个孔。 该室供应压缩气体以向抛光带施加向上的压力。 驱动辊连接到单独的马达以独立地驱动和控制至少所述两个抛光带。

公开(公告)号：US06613649B2

公开(公告)日：2003-09-02

申请号：US10002873

申请日：2001-12-05

Applicant: Seng-Keong Victor Lim ,  Feng Chen ,  Alex See ,  Wang Ling Goh

Inventor： Seng-Keong Victor Lim ,  Feng Chen ,  Alex See ,  Wang Ling Goh

IPC: H01L2176

CPC classification number: H01L21/76224

Abstract: A method of manufacturing a shallow trench isolation using a polishing step with reduced dishing. A pad layer, a polish stop layer, a buffer layer and a hard mask layer are formed over a substrate. The hard mask layer has a hard mask opening. We etch a trench opening in the buffer layer, the polish stop layer, the pad layer and form a trench in the substrate using the hard mask layer as an etch mask. We form an oxide trench liner layer along the sidewalls of the trench and an oxide buffer liner layer on the sidewalls of the buffer layer using a thermal oxidation. The hard mask layer prevents the oxidation of the top surface of the buffer layer during the oxidation of the oxide trench liner. This prevents the buffer layer from being consumed by the oxidation and leaves the buffer layer to act in the subsequent chemical-mechanical polish (CMP) step. Next, an insulating layer is formed at least partially filling the trench. The insulating layer is chemical-mechanical polished using the polish stop layer as a stop layer. The buffer layer acts to prevent field oxide dishing during the chemical-mechanical polish.

Abstract translation: 使用具有减少的凹陷的抛光步骤制造浅沟槽隔离的方法。 在衬底上形成焊盘层，抛光停止层，缓冲层和硬掩模层。 硬掩模层具有硬掩模开口。 我们使用硬掩模层作为蚀刻掩模，在缓冲层，抛光停止层，焊盘层中蚀刻沟槽开口，并在衬底中形成沟槽。 我们使用热氧化沿着沟槽的侧壁和缓冲层的侧壁上的氧化物缓冲衬垫层形成氧化物沟槽衬里层。 硬掩模层防止在氧化物沟槽衬垫的氧化期间缓冲层的顶表面的氧化。 这防止缓冲层被氧化消耗，并使缓冲层在随后的化学 - 机械抛光（CMP）步骤中起作用。 接下来，形成至少部分地填充沟槽的绝缘层。 绝缘层使用抛光停止层作为停止层进行化学机械抛光。 缓冲层用于防止化学机械抛光过程中的场氧化物凹陷。

公开(公告)号：US09488599B2

公开(公告)日：2016-11-08

申请号：US12927411

申请日：2010-11-12

Applicant: Matthew P. Augustine ,  Stephen J. Harley ,  Victor Lim ,  Paul Stucky

Inventor： Matthew P. Augustine ,  Stephen J. Harley ,  Victor Lim ,  Paul Stucky

IPC: G06F17/18 ,  G01R27/28 ,  G01R23/00 ,  G01N22/00 ,  G01N33/14 ,  G01R33/12 ,  G01N33/00 ,  G01N27/22

CPC classification number: G01N22/00 ,  G01N27/221 ,  G01N33/00 ,  G01N33/14 ,  G01N33/146 ,  G01R33/12

Abstract: Methods, devices and systems for identifying or authenticating an intact bottle of wine are provided.

Abstract translation: 提供了用于识别或认证完整瓶葡萄酒的方法，设备和系统。

公开(公告)号：US20130252350A1

公开(公告)日：2013-09-26

申请号：US13429463

申请日：2012-03-26

Applicant: Hun Chow LEE ,  Shyue Fong QUEK ,  Seng-Keong Victor LIM ,  Fang Hong GN

Inventor： Hun Chow LEE ,  Shyue Fong QUEK ,  Seng-Keong Victor LIM ,  Fang Hong GN

IPC: H01L21/66 ,  G06F17/50

CPC classification number: H01L22/12

Abstract: A method of generating care areas is disclosed. An artwork file of a layout of a product is provided and a cell tree of the layout is formed. The cell tree includes a plurality of cells of the layout arranged in a hierarchical order. The method also includes defining care areas in the artwork file of the layout.

Abstract translation: 公开了一种生成护理区域的方法。 提供产品布局的图稿文件，形成布局的单元格树。 小区树包括以分层次序布置的布局的多个小区。 该方法还包括在布局的图稿文件中定义护理区域。

公开(公告)号：US20100306262A1

公开(公告)日：2010-12-02

申请号：US12474982

申请日：2009-05-29

Applicant: Justin H. Kuo ,  Hui-Lim Victor Lim

Inventor： Justin H. Kuo ,  Hui-Lim Victor Lim

IPC: G06F17/30

CPC classification number: G06F17/30595

Abstract: A mechanism by which rule attributes of varying types and numbers can be stored and searched in an efficient manner is provided by storing attribute values of each rule in a child table of a parent rule table. The child table is normalized and contains a foreign key pointing back to the parent rule table and has attribute-value pairs as table columns of the child table. Each rule is then represented by one row of the parent rule table and one or more corresponding rows of the child rule details table. A variable and unlimited number of attribute dimensions is supported among the rules, and search performance is improved through the use of database indexes on the rule details table attribute columns. Metadata representing the structure of the child rule details table will identify the data attributes for each dimension.

Abstract translation: 通过将每个规则的属性值存储在父规则表的子表中来提供可以以有效的方式存储和搜索不同类型和数字的规则属性的机制。 子表被归一化，并包含指向父规则表的外键，并将属性值对作为子表的表列。 然后，每个规则由父规则表的一行和子规则详细信息表的一个或多个相应行表示。 在规则中支持变量和无限数量的属性维度，通过在规则详细信息表属性列上使用数据库索引来提高搜索性能。 表示子规则详细信息表结构的元数据将标识每个维度的数据属性。