公开(公告)号：US4636088A

公开(公告)日：1987-01-13

申请号：US612076

申请日：1984-05-21

申请人： Allan Rosencwaig ,  Walter L. Smith

发明人： Allan Rosencwaig ,  Walter L. Smith

IPC分类号： G01N21/00 ,  G01N21/17 ,  G01N21/55 ,  G01N21/41 ,  G01N25/00

CPC分类号： G01N21/171

摘要： An apparatus and method is disclosed for evaluating surface conditions on a sample. The system is particularly suited for detecting thin residues encountered in semiconductor lithographic and etching processes. The system is also capable of measuring ion implanted dopant concentrations prior to annealing. The apparatus includes an intensity modulated laser beam which is focused on the surface of the sample to generate periodic heating. A second light beam is focused onto the periodically heated area of the sample in a manner such that it is reflected to a detector. The intensity changes in the probe beam, resulting from the temperature induced changes of reflectivity at the surface of the sample, are measured and evaluated to determine the absence or presence of residues, or to measure the concentrations of ion implanted dopants.

摘要翻译： 公开了一种用于评估样品上的表面状况的装置和方法。 该系统特别适用于检测半导体光刻和蚀刻工艺中遇到的薄残留物。 该系统还能够在退火之前测量离子注入的掺杂剂浓度。 该装置包括强度调制的激光束，其聚焦在样品的表面上以产生周期性加热。 第二光束以使得其被反射到检测器的方式聚焦在样品的周期性加热区域上。 测量和评估由温度引起的样品表面反射率变化导致的探针光束强度变化，以评估残留物的不存在或存在，或测量离子注入掺杂剂的浓度。