公开(公告)号：US11428925B2

公开(公告)日：2022-08-30

申请号：US16731249

申请日：2019-12-31

Applicant: ASML Netherlands B.V.

Inventor： Arjan Johannes Anton Beukman ,  Alessandro Polo ,  Henricus Petrus Maria Pellemans ,  Nitish Kumar

IPC: G02B26/00 ,  G03F7/20 ,  G01B11/27

Abstract: Disclosed is a metrology apparatus comprising an optical element configured to receive at or near a pupil plane of the metrology apparatus, at least first radiation comprising a first higher diffracted order and second radiation comprising a zeroth order resulting from illumination of a metrology target with radiation; and to direct said first radiation and second radiation together in a first direction. The metrology apparatus is further configured to form at least a first image of a first interference pattern, the first interference pattern resulting from interference of said first radiation and second radiation at an image plane.

公开(公告)号：US20210124276A1

公开(公告)日：2021-04-29

申请号：US17254601

申请日：2019-06-05

Applicant: ASML Netherlands B.V.

Inventor： Sebastianus Adrianus Goorden ,  Simon Reinald Huisman ,  Duygu Akbulut ,  Alessandro Polo ,  Johannes Antonius Gerardus Akkermans ,  Arie Jeffrey Den Boef

IPC: G03F9/00

Abstract: The invention provides a position sensor (300) which comprises an optical system (305, 306) configured to provide measurement radiation (304) to a substrate (307). The optical system is arranged to receive at least a portion of radiation (309) diffracted by a mark (308) provided on the substrate. A processor (313) is applied to derive at least one position-sensitive signal (312) from the received radiation. The measurement radiation comprises at least a first and a second selected radiation wavelength. The selection of the at least first and second radiation wavelengths is based on a position error swing-curve model.

公开(公告)号：US10788766B2

公开(公告)日：2020-09-29

申请号：US16611500

申请日：2018-03-06

Applicant: ASML Netherlands B.V.

Inventor： Sebastianus Adrianus Goorden ,  Simon Reinald Huisman ,  Duygu Akbulut ,  Alessandro Polo ,  Simon Gijsbert Josephus Mathijssen

IPC: G03B27/54 ,  G03F9/00 ,  G01B11/27 ,  G03F7/20

Abstract: Disclosed is a metrology sensor apparatus and associated method. The metrology sensor apparatus comprises an illumination system operable to illuminate a metrology mark on a substrate with illumination radiation having a first polarization state and an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark. The metrology mark comprises a main structure and changes, relative to the first polarization state, at least one of a polarization state of a first portion of the scattered radiation predominately resultant from scattering by the main structure and a polarization state of a second portion of radiation predominately resultant from scattering by one or more features other than the main structure, such that the polarization state of the first portion of the scattered radiation is different to the polarization state of the second portion of the scattered radiation. The metrology sensor apparatus further comprises an optical filtering system which filters out the second portion of the scattered radiation based on its polarization state.

公开(公告)号：US10678145B2

公开(公告)日：2020-06-09

申请号：US15941324

申请日：2018-03-30

Applicant: ASML Netherlands B.V.

Inventor： Alessandro Polo ,  Nitesh Pandey ,  Armand Eugene Albert Koolen

IPC: G03F7/20 ,  G01N21/47 ,  G01B11/14 ,  G01J3/04 ,  G01B11/02 ,  G01J3/02 ,  G01N21/95

Abstract: A radiation receiving system for an inspection apparatus, used to perform measurements on target structures on lithographic substrates as part of a lithographic process, comprises a spectrometer with a number of inputs. The radiation receiving system comprises: a plurality of inputs, each input being arranged to provide radiation from a target structure; a first optical element operable to receive radiation from each of the plurality of inputs; a second optical element operable to receive radiation from the first optical element and to scatter the radiation; and a third optical element operable to direct the scattered radiation onto a detector. The second optical element may for example be a reflective diffraction grating that diffracts incoming radiation into an output radiation spectrum.

公开(公告)号：US11099489B2

公开(公告)日：2021-08-24

申请号：US16712862

申请日：2019-12-12

Applicant: ASML Netherlands B.V.

Inventor： Hugo Augustinus Joseph Cramer ,  Hilko Dirk Bos ,  Erik Johan Koop ,  Armand Eugene Albert Koolen ,  Han-Kwang Nienhuys ,  Alessandro Polo ,  Jin Lian ,  Arie Jeffrey Den Boef

IPC: G03F7/20 ,  G01N21/47 ,  G01N21/956 ,  G01N21/95

Abstract: The disclosure relates to measuring a parameter of a lithographic process and a metrology apparatus. In one arrangement, radiation from a radiation source is modified and used to illuminate a target formed on a substrate using the lithographic process. Radiation scattered from a target is detected and analyzing to determine the parameter. The modification of the radiation comprises modifying a wavelength spectrum of the radiation to have a local minimum between a global maximum and a local maximum, wherein the power spectral density of the radiation at the local minimum is less than 20% of the power spectral density of the radiation at the global maximum and the power spectral density of the radiation at the local maximum is at least 50% of the power spectral density of the radiation at the global maximum.

公开(公告)号：US20200209608A1

公开(公告)日：2020-07-02

申请号：US16731249

申请日：2019-12-31

Applicant: ASML Netherlands B.V.

Inventor： Arjan Johannes Anton Beukman ,  Alessandro Polo ,  Henricus Petrus Maria Pellemans ,  Nitish Kumar

IPC: G02B26/00

Abstract: Disclosed is a metrology apparatus comprising an optical element configured to receive at or near a pupil plane of the metrology apparatus, at least first radiation comprising a first higher diffracted order and second radiation comprising a zeroth order resulting from illumination of a metrology target with radiation; and to direct said first radiation and second radiation together in a first direction. The metrology apparatus is further configured to form at least a first image of a first interference pattern, the first interference pattern resulting from interference of said first radiation and second radiation at an image plane.

公开(公告)号：US10527959B2

公开(公告)日：2020-01-07

申请号：US16325471

申请日：2017-06-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Simon Reinald Huisman ,  Simon Gijsbert Josephus Mathijssen ,  Sebastianus Adrianus Goorden ,  Duygu Akbulut ,  Alessandro Polo

IPC: G03F7/20 ,  G03F9/00 ,  G02B5/20 ,  G02B5/30

Abstract: An alignment sensor for a lithographic apparatus has an optical system configured to deliver, collect and process radiation selectively in a first waveband (e.g. 500-900 nm) and/or in a second waveband (e.g. 1500-2500 nm). The radiation of the first and second wavebands share a common optical path in at least some portion of the optical system, while the radiation of the first waveband is processed by a first processing sub-system and the radiation of the second waveband is processed by a second processing sub-system. The processing subsystems in one example include self-referencing interferometers. The radiation of the second waveband allows marks to be measured through an opaque layer. Optical coatings and other components of each processing sub-system can be tailored to the respective waveband, without completely duplicating the optical system.

公开(公告)号：US10466601B2

公开(公告)日：2019-11-05

申请号：US15756057

申请日：2016-08-23

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Alessandro Polo ,  Simon Gijsbert Josephus Mathijssen ,  Patricius Aloysius Jacobus Tinnemans ,  Scott Douglas Coston ,  Ronan James Havelin

IPC: G03F7/20 ,  G03F9/00 ,  G02B6/293 ,  G02B27/10 ,  G02B27/14

Abstract: A lithographic apparatus includes an alignment sensor configured to determine the position of an alignment target having a periodic structure. The alignment sensor includes a demultiplexer to demultiplex a number of intensity channels. The demultiplexer includes a number of stages arranged in series and a number of demultiplexing components, each demultiplexing component operable to divide an input radiation beam into two radiation beam portions. The first stage has a first demultiplexing component that is arranged to receive as an input radiation beam an incident radiation beam. Each successive stage is arranged such that it has twice the number of demultiplexing components as a preceding stage, each demultiplexing component of each stage after the first stage receiving as an input one of the radiation beam portions output from a demultiplexing component of the preceding stage.

公开(公告)号：US10101675B2

公开(公告)日：2018-10-16

申请号：US15444765

申请日：2017-02-28

Applicant: ASML Netherlands B.V.

Inventor： Alessandro Polo ,  Simon Gijsbert Josephus Mathijssen

IPC: G03F9/00 ,  G03F7/20 ,  G01B11/27 ,  G01B11/30 ,  G01B11/00 ,  G01B11/02 ,  G01N21/95

Abstract: Disclosed is a metrology apparatus and method for measuring a structure formed on a substrate by a lithographic process. The metrology apparatus comprises an illumination system operable to provide measurement radiation comprising a plurality of wavelengths; and a hyperspectral imager operable to obtain a hyperspectral representation of a measurement scene comprising the structure, or a part thereof, from scattered measurement radiation subsequent to the measurement radiation being scattered by the structure.