公开(公告)号：US20150138519A1

公开(公告)日：2015-05-21

申请号：US14395981

申请日：2013-04-05

Applicant: ASML Netherlands B.V.

Inventor： Carlo Cornelis Maria Luijten

IPC: G03F7/20 ,  H05G2/00

CPC classification number: G03F7/70916 ,  G03F7/70033 ,  G03F7/70883 ,  H05G2/008

Abstract: Disclosed is a contamination trap arrangement (300) configured to trap debris particles that are generated with the formation of a plasma within a radiation source configured to generate extreme ultraviolet radiation. The contamination trap comprises a vane structure (310) for trapping the debris particles; a heating arrangement (330) for heating the vane structure, the heating arrangement being in thermal communication with the vane structure; a cooling arrangement (350) for transporting heat generated as a result of the plasma formation, away from the vane structure, and a gap (370) between the heating arrangement and the cooling arrangement. The cooling arrangement is in thermal communication with the vane structure via the heating arrangement and the gap and the contamination trap also comprises a heat transfer adjustment arrangement operable to adjust the heat transfer characteristics of a fluid inside of the gap by providing for controllable relative movement between the surfaces defining the gap.

Abstract translation: 公开了一种污染捕集装置（300），其被配置成捕获在被配置为产生极紫外辐射的辐射源内形成等离子体而产生的碎屑颗粒。 污染物捕集器包括用于捕获碎屑颗粒的叶片结构（310） 用于加热所述叶片结构的加热装置（330），所述加热装置与所述叶片结构热连通; 用于将等离子体形成结果产生的热量远离叶片结构传送的冷却装置和加热装置与冷却装置之间的间隙（370）。 冷却装置通过加热装置与叶片结构热连通并且间隙，并且污染物捕集阱还包括热传递调节装置，其可操作以通过提供间隙之间的可控相对运动来调节间隙内部的流体的传热特性 表面限定间隙。

公开(公告)号：US20150015856A1

公开(公告)日：2015-01-15

申请号：US14356358

申请日：2012-10-12

Applicant: ASML Netherlands B.V.

Inventor： Manish Ranjan ,  Carlo Cornelis Maria Luijten ,  Franciscus Johannes Joseph Janssen ,  Maksym Chernyshov

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70633 ,  G03F7/70716 ,  G03F7/70933

Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus includes a temperature control apparatus disposed in a space between the projection system and the substrate table. The temperature control device is configured to control the temperature of the gas in the space after the gas passes through the opening.

Abstract translation: 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备包括设置在投影系统和基板台之间的空间中的温度控制装置。 温度控制装置被配置为在气体通过开口之后控制空间中的气体的温度。