公开(公告)号：US09823590B2

公开(公告)日：2017-11-21

申请号：US15451358

申请日：2017-03-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Manish Ranjan ,  Carlo Cornelis Maria Luijten ,  Franciscus Johannes Joseph Janssen ,  Maksym Chernyshov

IPC: B60R1/06 ,  G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70633 ,  G03F7/70716 ,  G03F7/70933

Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus includes a temperature control apparatus disposed in a space between the projection system and the substrate table. The temperature control device is configured to control the temperature of the gas in the space after the gas passes through the opening.

公开(公告)号：US20150015856A1

公开(公告)日：2015-01-15

申请号：US14356358

申请日：2012-10-12

Applicant: ASML Netherlands B.V.

Inventor： Manish Ranjan ,  Carlo Cornelis Maria Luijten ,  Franciscus Johannes Joseph Janssen ,  Maksym Chernyshov

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70633 ,  G03F7/70716 ,  G03F7/70933

Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus includes a temperature control apparatus disposed in a space between the projection system and the substrate table. The temperature control device is configured to control the temperature of the gas in the space after the gas passes through the opening.

Abstract translation: 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备包括设置在投影系统和基板台之间的空间中的温度控制装置。 温度控制装置被配置为在气体通过开口之后控制空间中的气体的温度。

公开(公告)号：US09625835B2

公开(公告)日：2017-04-18

申请号：US14356358

申请日：2012-10-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Manish Ranjan ,  Carlo Cornelis Maria Luijten ,  Franciscus Johannes Joseph Janssen ,  Maksym Chernyshov

IPC: B60R1/06 ,  G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70633 ,  G03F7/70716 ,  G03F7/70933

Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus includes a temperature control apparatus disposed in a space between the projection system and the substrate table. The temperature control device is configured to control the temperature of the gas in the space after the gas passes through the opening.