公开(公告)号：US20190043749A1

公开(公告)日：2019-02-07

申请号：US16075754

申请日：2016-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Robby Franciscus Josephus MARTENS ,  Youssef Karel Maria DE VOS ,  Ringo Petrus Cornelis VAN DORST ,  Gerhard Albert TEN BRINKE ,  Dirk Jerome Andre SENDEN ,  Coen Hubertus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Jelmer Mattheüs KAMMINGA ,  Evelyn Wallis PACITTI ,  Thomas POIESZ ,  Arie Cornelis SCHEIBERLICH ,  Bert Dirk SCHOLTEN ,  André SCHREUDER ,  Abraham Alexander SOETHOUDT ,  Siegfried Alexander TROMP ,  Yuri Johannes Gabriël VAN DE VIJVER

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/687 ,  B25B11/00

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

公开(公告)号：US20180364584A1

公开(公告)日：2018-12-20

申请号：US15781813

申请日：2016-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Daan Daniel Johannes Antonius VAN SOMMEREN ,  Coen Hubertus Matheus BALTIS ,  Harold Sebastiaan BUDDENBERG ,  Giovanni Luca GATTOBIGIO ,  Johannes Cornelis Paulus MELMAN ,  Günes NAKIBOGLU ,  Theodorus Wilhelmus POLET ,  Walter Theodorus Matheus STALS ,  Yuri Johannes Gabriël VAN DE VIJVER ,  Josephus Peter VAN LIESHOUT ,  Jorge Alverto VIEYRA SALAS ,  Aleksandar Nikolov ZDRAVKOV

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/70716

Abstract: A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.