公开(公告)号：US20190129301A1

公开(公告)日：2019-05-02

申请号：US16301465

申请日：2017-04-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Willem-Pieter VOORTHUIJZEN ,  Marie-Claire VAN LARE ,  Sander Frederik WUISTER

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/038 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16 ,  H01L21/027

Abstract: A resist composition having a) metal-containing nanoparticles and/or nanoclusters, and b) ligands and or organic linkers, wherein one or both of a) or b) are multivalent. A resist composition wherein: the resist composition is a negative resist and the nanoparticles and/or nanoclusters cluster upon crosslinking of the ligands and/or organic linkers following exposure to electromagnetic radiation or an electron beam; or the resist composition is a negative resist and the ligands and/or organic linkers are crosslinked and the crosslinking bonds are broken upon exposure to electromagnetic radiation or an electron beam allowing the nanoparticles and/or nanoclusters to cluster together; or the resist composition is a positive resist and the ligands and/or organic linkers are crosslinked and the crosslinking bonds are broken upon exposure to electromagnetic radiation or an electron beam.