公开(公告)号：US10908510B2

公开(公告)日：2021-02-02

申请号：US16550451

申请日：2019-08-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Catharinus De Schiffart ,  Michael Jozef Mathijs Renkens ,  Gerard Van Schothorst ,  Andre Bernardus Jeunink ,  Gregor Edward Van Baars ,  Sander Frederik Wuister ,  Yvonne Wendela Kruijt-Stegeman ,  Norbert Erwin Therenzo Jansen ,  Toon Hardeman ,  George Arie Jan De Fockert ,  Johan Frederik Dijksman

IPC: G03F7/20 ,  G03F9/00

Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.

公开(公告)号：US10580545B2

公开(公告)日：2020-03-03

申请号：US14917623

申请日：2014-09-24

Applicant: ASML Netherlands B.V.

Inventor： Vadim Yevgenyevich Banine ,  Petrus Rutgerus Bartraij ,  Ramon Pascal Van Gorkom ,  Lucas Johannes Peter Ament ,  Pieter Willem Herman De Jager ,  Gosse Charles De Vries ,  Rilpho Ludovicus Donker ,  Wouter Joep Engelen ,  Olav Waldemar Vladimir Frijns ,  Leonardus Adrianus Gerardus Grimminck ,  Andelko Katalenic ,  Erik Roelof Loopstra ,  Han-Kwang Nienhuys ,  Andrey Alexandrovich Nikipelov ,  Michael Jozef Mathijs Renkens ,  Franciscus Johannes Joseph Janssen ,  Borgert Kruizinga

IPC: G03F7/20 ,  G21K1/06

Abstract: A delivery system for use within a lithographic system. The beam delivery system comprises optical elements arranged to receive a radiation beam from a radiation source and to reflect portions of radiation along one or more directions to form a one or more branch radiation beams for provision to one or more tools.