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公开(公告)号：US11635696B2
公开(公告)日：2023-04-25
申请号：US17120506
申请日：2020-12-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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Patent Agency Ranking
公开(公告)号：US20160195823A1
公开(公告)日：2016-07-07
申请号：US15046284
申请日：2016-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Yvonne Wendela KRUIJT-STEGEMAN , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
Abstract translation: 公开了一种压印光刻设备，其包括布置成保持压印模板的压印模板保持器和被配置为测量压印模板的尺寸和/或形状的变化的多个位置传感器，其中位置传感器与 印记模板 还公开了一种光刻方法，其包括使用压印模板将图案印刷到基板上，以及在将图案压印到基板上的同时测量压印模板的尺寸和/或形状的变化。
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公开(公告)号：US12147162B2
公开(公告)日：2024-11-19
申请号：US18124350
申请日：2023-03-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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公开(公告)号：US10890851B2
公开(公告)日：2021-01-12
申请号：US15828523
申请日：2017-12-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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公开(公告)号：US10712678B2
公开(公告)日：2020-07-14
申请号：US15046284
申请日：2016-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
IPC: B29C43/58 , G03F9/00 , B82Y10/00 , B82Y40/00 , G03F7/00 , G03F7/20 , B29C43/02 , B29C59/02 , B29C59/16
Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
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公开(公告)号：US10908510B2
公开(公告)日：2021-02-02
申请号：US16550451
申请日：2019-08-26
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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