公开(公告)号：US20150277238A1

公开(公告)日：2015-10-01

申请号：US14739751

申请日：2015-06-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Koert STAVENGA ,  Sergei SHULEPOV ,  Koen STEFFENS ,  Matheus Anna Karel VAN LIEROP ,  Samuel Bertrand Dominique DAVID ,  David BESSEMS

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341 ,  G03F7/707 ,  G03F7/70866 ,  H01L21/68 ,  H01L21/68735

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

Abstract translation: 公开了一种用于浸没式光刻设备的衬底台，其具有构造成容纳给定尺寸的衬底的凹部和流体提取系统，其被配置为从衬底的边缘和凹部的边缘之间的间隙中提取流体， 流体提取系统被配置为使得从间隙的局部区域提取的流体的流速大于从间隙的另一部分提取的流体的流动速率。