公开(公告)号：US20210173294A1

公开(公告)日：2021-06-10

申请号：US17119331

申请日：2020-12-11

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Joost Jeroen OTTENS ,  Edwin Cornelis KADIJK ,  Sergei SHULEPOV

IPC: G03B27/42 ,  G03F7/20

Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

公开(公告)号：US20170003605A1

公开(公告)日：2017-01-05

申请号：US15266453

申请日：2016-09-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Sergei SHULEPOV

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  H01L21/67034

Abstract: A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.

Abstract translation: 通过确保在待干燥的表面上的液膜中形成压力梯度，配置成干燥浸没式光刻设备中的表面的气刀被优化以去除液体。

公开(公告)号：US20180203365A1

公开(公告)日：2018-07-19

申请号：US15920788

申请日：2018-03-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes ROSET ,  Nicolaas TEN KATE ,  Sergei SHULEPOV ,  Raymond Wilhelmus Louis LAFARRE

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.

公开(公告)号：US20160179014A1

公开(公告)日：2016-06-23

申请号：US14973421

申请日：2015-12-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Niek Jacobus Johannes ROSET ,  Nicolaas TEN KATE ,  Sergei SHULEPOV ,  Raymond Wilhelmus Louis LAFARRE

IPC: G03F7/20

CPC classification number: G03F7/70341

Abstract: A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.

Abstract translation: 一种具有流体处理结构的光刻设备，其被配置为将浸没流体包含在与衬底台的上表面相邻的空间中和/或位于所述衬底台的凹部中的衬底上，所述盖包括平面主体，所述平面主体在使用中 从衬底的上表面延伸到基板的上主表面的周边部分，以覆盖凹部的边缘和基板的边缘之间的间隙，以及浸没流体膜破坏器，其构造成破坏基板 在衬底台相对于流体处理结构移动期间，在盖的边缘和由流体处理结构容纳的浸没流体之间形成浸没流体膜。

公开(公告)号：US20190324374A1

公开(公告)日：2019-10-24

申请号：US16460159

申请日：2019-07-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Richard Joseph BRULS ,  Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Ronald Walther Jeanne SEVERIJNS ,  Sergei SHULEPOV ,  Herman BOOM ,  Timotheus Franciscus SENGERS

IPC: G03F7/20

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

公开(公告)号：US20160004171A1

公开(公告)日：2016-01-07

申请号：US14839633

申请日：2015-08-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Bob STREEFKERK ,  Johannes Jacobus Matheus BASELMANS ,  Richard Joseph BRULS ,  Marcel Mathijs Theodore Marie DIERICHS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Hans JANSEN ,  Erik Roelof LOOPSTRA ,  Jeroen Johannes Sophia Maria MERTENS ,  Johannes Catharinus Hubertus MULKENS ,  Ronald Walther Jeanne SEVERIJNS ,  Sergei SHULEPOV ,  Herman BOOM ,  Timotheus Franciscus SENGERS

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

公开(公告)号：US20230127070A1

公开(公告)日：2023-04-27

申请号：US18087320

申请日：2022-12-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Joost Jeroen OTTENS ,  Edwin Cornelis KADIJK ,  Sergei SHULEPOV

IPC: G03B27/42 ,  G03F7/20

Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.

公开(公告)号：US20200050116A1

公开(公告)日：2020-02-13

申请号：US16657267

申请日：2019-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Koert STAVENGA ,  Sergei SHULEPOV ,  Koen STEFFENS ,  Matheus Ana Karel VAN LIEROP ,  Samuel Bertrand Dominique DAVID ,  David BESSEMS

IPC: G03F7/20 ,  H01L21/687 ,  H01L21/68

Abstract: A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.

公开(公告)号：US20170038695A1

公开(公告)日：2017-02-09

申请号：US15299240

申请日：2016-10-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Marcel BECKERS ,  Stefan Philip Christiaan BELFROID ,  Ferdy MIGCHELBRINK ,  Sergei SHULEPOV

IPC: G03F7/20

Abstract: A plurality of extraction conduits is provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.

Abstract translation: 提供多个提取管道以将浸入液体移入室中。 提取管道布置在与基板的目标部分不同的距离处。 提供了一个通道，吸入力被施加到该通道上。 当所有导管充满浸没液体时，提取能力将大于当一个或多个导管包含气体时的提取能力。

公开(公告)号：US20150309422A1

公开(公告)日：2015-10-29

申请号：US14792143

申请日：2015-07-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas Rudolf KEMPER ,  Sjoerd Nicolaas Lambertus DONDERS ,  Christiaan Alexander HOOGENDAM ,  Nicolaas TEN KATE ,  Sergei SHULEPOV

IPC: G03F7/20

CPC classification number: G03F7/70866 ,  G03F7/70341 ,  H01L21/67034

Abstract: A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.

Abstract translation: 通过确保在待干燥的表面上的液膜中形成压力梯度，配置成干燥浸没式光刻设备中的表面的气刀被优化以去除液体。